公开(公告)号：US20200095406A1

公开(公告)日：2020-03-26

申请号：US16582451

申请日：2019-09-25

Applicant: HITACHI METALS, LTD.

Inventor： Shingo ASHIHARA ,  Hirotaka YASAKI ,  Takashi AOYAMA

IPC: C08L23/08 ,  C08L23/26 ,  H01B7/02 ,  H01B13/14 ,  H01B7/295 ,  H01B3/44

Abstract: A halogen-free resin composition is disclosed comprising a base polymer. In the halogen-free resin composition, the content of a compound including magnesium is equal to or less than 30 parts by mass relative to 100 parts by mass of the base polymer; and the content of a compound including calcium is equal to or less than 30 parts by mass relative to 100 parts by mass of the base polymer. The halogen-free resin composition has an oxygen index of 20 or more. Preferably, the halogen-free resin composition further includes a heavy metal deactivator. Preferably, the base polymer includes a polymer that has a melting point of 120° C.