公开(公告)号：US5989625A

公开(公告)日：1999-11-23

申请号：US869119

申请日：1997-06-04

申请人： Heinz Hilgers ,  Pierre Joeris ,  Martin Straub

发明人： Heinz Hilgers ,  Pierre Joeris ,  Martin Straub

IPC分类号： C23C16/50 ,  C23C16/26 ,  C23C16/27 ,  C23C16/56 ,  C23F4/00 ,  G11B5/127 ,  G11B5/187 ,  G11B5/255 ,  G11B5/31 ,  G11B5/84 ,  G11B5/72

CPC分类号： G11B5/84 ,  C23C16/26 ,  C23C16/56 ,  G11B5/255 ,  G11B5/8408 ,  G11B5/3106

摘要： A process is described for the modification of the outermost atomic layer of a substrate, such as a carbon layer having hydrogen atoms bonded at the surface, in a plasma chamber to covalently bond carbon-flourine groups such as CF.sub.3 groups to carbon atoms in the surface. After establishing a plasma process in which both etching and deposition are ocurring, a fluorinated gas is injected into the chamber to allow CF.sub.3 groups to bond to the surface. The process does not apply of a layer with a defined thickness, but rather conditions the surface for desired properties of high affinity for lubricants and low affinity for contaminants. The invention is particularly useful for heads and disks for use in magnetic recording.

摘要翻译： 描述了用于在等离子体室中修饰诸如在表面具有氢原子的碳层的基底的最外层原子层的方法，以将表面上的碳原子等CF 3基团与碳原子共价键合 。 在建立蚀刻和沉积两者之间的等离子体工艺之后，将氟化气体注入室中以允许CF 3基团结合到表面。 该方法不适用于具有确定厚度的层，而是对表面进行条件，以获得对润滑剂具有高亲和力的所需性质，并且对污染物具有低亲和力。 本发明对于用于磁记录的磁头和磁盘特别有用。