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1.发明申请Method for cleaning a glass substrate, method for fabricating a glass substrate, and magnetic disk using the same 审中-公开玻璃基板的清洗方法，玻璃基板的制造方法以及使用其的磁盘公开(公告)号：US20080014469A1
公开(公告)日：2008-01-17
申请号：US11824770
申请日：2007-07-02
CPC分类号： G11B5/8404 , B08B1/04 , B08B3/04 , C03C23/0075
摘要： A method for cleaning a glass substrate containing SiO2 as a main ingredient thereof ensuring removal of abrasive and foreign matter adhered to the glass substrate after a polishing step, without complicating a cleaning step, including a process in which the glass substrate is cleaned by scrubbing using a liquid having Si element stationary in a range from 1 to 5 000 ppb/mm2.
摘要翻译： 一种用于清洗含有SiO 2的玻璃基板作为主要成分的方法，其确保在抛光步骤之后除去粘附到玻璃基板上的磨料和异物，而不会使清洁步骤复杂化，包括其中 通过使用具有1至5 000ppb / mm 2范围内的Si元素静止的液体进行擦洗来清洁玻璃基板。
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2.发明申请Method for cleaning a glass substrate, method for fabricating a glass substrate, and magnetic disk using same 有权玻璃基板的清洗方法，玻璃基板的制造方法以及使用其的磁盘公开(公告)号：US20080026261A1
公开(公告)日：2008-01-31
申请号：US11824775
申请日：2007-07-02
CPC分类号： G11B5/8404 , B08B1/04 , B08B3/08 , C03C15/00 , C03C23/0075
摘要： A method for cleaning a glass substrate which ensures removal of abrasive and other foreign matter without making a cleaning step complicated involves cleaning the glass substrate by scrubbing using two or more types of cleaning liquid having different Si element elution abilities. The cleaning liquid having the highest Si element elution is used first, and the cleaning liquid having the lowest Si element elution is used last.
摘要翻译： 用于清洁玻璃基板的方法，其确保在不进行清洁步骤的情况下清除磨料和其它异物的复杂性包括通过使用具有不同Si元素洗脱能力的两种或更多种类型的清洗液进行擦洗来清洁玻璃基板。 首先使用具有最高Si元素洗脱的清洗液，最后使用具有最低Si元素洗脱的清洗液。
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3.发明申请Method for fabricating a glass substrate for an information recording medium and magnetic disk 审中-公开用于制造用于信息记录介质和磁盘的玻璃基板的方法公开(公告)号：US20080011017A1
公开(公告)日：2008-01-17
申请号：US11824769
申请日：2007-07-02
IPC分类号： C03C19/00
CPC分类号： C03C19/00 , C03C23/0075 , G11B5/8404
摘要： A method for fabricating a glass substrate for an information recording medium ensures removal of an abrasive or foreign mater adhered to the glass substrate after a polishing step, and involves, after the polishing step, keeping the surface of the glass substrate in contact with a liquid for 10 minutes or more before a scrub-cleaning step. To ensure that the abrasive or foreign matter firmly adhered to the glass substrate is removed by scrub-cleaning, preferably, the surface of the glass substrate is kept in contact with the liquid with the glass substrate immersed in the liquid which is collected.
摘要翻译： 制造用于信息记录介质的玻璃基板的方法确保在抛光步骤之后除去附着在玻璃基板上的研磨剂或外来物质，并且在抛光步骤之后包括保持玻璃基板的表面与液体接触 洗涤10分钟以上。 为了确保通过擦洗来清除粘附在玻璃基板上的磨料或异物，优选玻璃基板的表面与液体保持接触，玻璃基板浸没在收集的液体中。
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4.发明授权Method for fabricating a glass substrate for an information recording medium, and magnetic disk using the same 有权用于制造用于信息记录介质的玻璃基板的方法和使用其的磁盘公开(公告)号：US08141386B2
公开(公告)日：2012-03-27
申请号：US11824768
申请日：2007-07-02
CPC分类号： G11B5/8404 , C03C19/00
摘要： A method for fabricating a glass substrate containing SiO2 as a main ingredient thereof for an information recording medium which ensures removal of abrasive or foreign mater adhered to the glass substrate without complicating a cleaning step, involves, after a polishing step, keeping the surface of the glass substrate in contact with a liquid having a Si element elution in a range from 100 to 10 000 ppb/mm2 before a scrub-cleaning step.
摘要翻译： 一种制造含有SiO 2作为其主要成分的玻璃基板的方法，用于信息记录介质，其确保去除附着在玻璃基板上的磨料或外来物而不使清洗步骤复杂化，包括在抛光步骤之后，保持表面 玻璃基板在洗涤步骤之前与具有100至10000ppb / mm 2范围内的Si元素洗脱的液体接触。
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5.发明授权Method for cleaning a glass substrate, method for fabricating a glass substrate, and magnetic disk using same 有权玻璃基板的清洗方法，玻璃基板的制造方法以及使用其的磁盘公开(公告)号：US08113017B2
公开(公告)日：2012-02-14
申请号：US11824775
申请日：2007-07-02
CPC分类号： G11B5/8404 , B08B1/04 , B08B3/08 , C03C15/00 , C03C23/0075
摘要： A method for cleaning a glass substrate which ensures removal of abrasive and other foreign matter without making a cleaning step complicated involves cleaning the glass substrate by scrubbing using two or more types of cleaning liquid having different Si element elution abilities. The cleaning liquid having the highest Si element elution is used first, and the cleaning liquid having the lowest Si element elution is used last.
摘要翻译： 用于清洁玻璃基板的方法，其确保在不进行清洁步骤的情况下清除磨料和其它异物的复杂性包括通过使用具有不同Si元素洗脱能力的两种或更多种类型的清洗液进行擦洗来清洁玻璃基板。 首先使用具有最高Si元素洗脱的清洗液，最后使用具有最低Si元素洗脱的清洗液。
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6.发明申请Method for fabricating a glass substrate for an information recording medium, and magnetic disk using the same 有权用于制造用于信息记录介质的玻璃基板的方法和使用其的磁盘公开(公告)号：US20080014468A1
公开(公告)日：2008-01-17
申请号：US11824768
申请日：2007-07-02
CPC分类号： G11B5/8404 , C03C19/00
摘要： A method for fabricating a glass substrate containing SiO2 as a main ingredient thereof for an information recording medium which ensures removal of abrasive or foreign mater adhered to the glass substrate without complicating a cleaning step, involves, after a polishing step, keeping the surface of the glass substrate in contact with a liquid having a Si element elution in a range from 100 to 10 000 ppb/mm2 before a scrub-cleaning step.
摘要翻译： 用于制造含有SiO 2作为其主要成分的玻璃基板的方法，用于信息记录介质，其确保去除附着到玻璃基板上的磨料或外来物而不使清洁步骤复杂化，包括在 抛光步骤，在擦洗步骤之前，保持玻璃基板的表面与具有Si元素洗脱的液体在100至10000ppb / mm 2的范围内接触。
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