公开(公告)号：US06351367B1

公开(公告)日：2002-02-26

申请号：US09163081

申请日：1998-09-29

申请人： Hiroshi Mogi ,  Yoshikazu Ohtani ,  Kenichi Arai ,  Shinji Kojima ,  Toshimi Kobayashi

发明人： Hiroshi Mogi ,  Yoshikazu Ohtani ,  Kenichi Arai ,  Shinji Kojima ,  Toshimi Kobayashi

IPC分类号： H01C1012

CPC分类号： B25B11/002 ,  H01L21/6833 ,  Y10T29/49117 ,  Y10T29/49124 ,  Y10T279/23

摘要： There is disclosed an electrostatic holding apparatus in which a voltage is applied to an conductive electrode covered with an insulating dielectric layer in order to cause the insulating dielectric layer to electrostatically attract an object. The main component of the insulating dielectric layer is ceramic containing 0.1-30 wt. % of an atomic metal, and the volume resistivity of the metal-containing ceramic at 20° C. is 108-1013 &OHgr;·cm. The metallic element is Mo or W. In the electrostatic holding apparatus, since the volume resistivity of an insulating dielectric layer of an electrostatic attraction portion is decreased, a strong electrostatic force can be generated. Also, there can be maintained the capability of allowing removal of an object at the time of stopping application of voltage. Further, since neither fine cracks nor pores remain in the insulating dielectric layer after sintering, the withstand voltage is high.

摘要翻译： 公开了一种静电保持装置，其中电压施加到被绝缘电介质层覆盖的导电电极，以使绝缘介电层静电吸引物体。 绝缘介电层的主要成分是含有0.1-30wt。 原子金属的％，并且含金属陶瓷在20℃下的体积电阻率为108-1013欧米加。 金属元素是Mo或W.在静电保持装置中，由于静电吸引部分的绝缘电介质层的体积电阻率降低，所以可以产生强的静电力。 此外，在停止施加电压时可以保持允许物体移除的能力。 此外，由于在烧结之后绝缘介电层中既没有微细的裂缝也没有孔，所以耐电压高。