公开(公告)号：US10790111B2

公开(公告)日：2020-09-29

申请号：US16479356

申请日：2017-02-24

Applicant: Hitachi High-Tech Corporation

Inventor： Seiichiro Kanno ,  Hiroyuki Andou

IPC: H01J37/02 ,  H01J37/20

Abstract: The objective of the present invention is to provide a charged-particle beam device wherein suppressing the effects of static build-up is compatible with executing high-throughput measurements and examination. In order to achieve this objective, proposed is the charged-particle beam device equipped with an electrostatic chuck (803), comprising an electrometer (11) for measuring the electric potential of the electrostatic chuck, a charge removing device (805) for removing charge from the electrostatic chuck, and a control device (806) for controlling the charge removing device in such a manner that the charge removal by the charge removing device is executed after reaching a certain number of processed samples irradiated by the charged particle beam, or after a predetermined processing time. When the result of the electric potential measurement by the electrometer does not meet a predetermined condition, the control device executes at least one among increasing and decreasing the number processed or the processing time.

公开(公告)号：US10903036B2

公开(公告)日：2021-01-26

申请号：US17005630

申请日：2020-08-28

Applicant: Hitachi High-Tech Corporation

Inventor： Seiichiro Kanno ,  Hiroyuki Andou

IPC: H01J37/20 ,  H02N13/00 ,  H01J37/02

Abstract: A charged-particle beam device wherein suppressing the effects of static build-up is compatible with executing high-throughput measurements and examination. The charged-particle beam device equipped with an electrostatic chuck (803), includes an electrometer (11) for measuring the electric potential of the electrostatic chuck, a charge removing device (805) for removing charge from the electrostatic chuck, and a control device (806) for controlling the charge removing device in such a manner that the charge removal by the charge removing device is executed after reaching a certain number of processed samples irradiated by the charged particle beam, or after a predetermined processing time. When the result of the electric potential measurement by the electrometer does not meet a predetermined condition, the control device executes at least one among increasing and decreasing the number processed or the processing time.