公开(公告)号：US20140001359A1

公开(公告)日：2014-01-02

申请号：US13922239

申请日：2013-06-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Makoto EZUMI ,  Satoru IWAMA ,  Junichi KAKUTA ,  Takahiro SATO ,  Akira IKEGAMI

IPC: H01J37/26

CPC classification number: H01J37/26 ,  G01N23/2251 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0048 ,  H01J2237/281

Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract translation: 作为用于实现具有大纵横比的接触孔的精确观察，检查或测量的一个方面，提出了在将第一电子束扫描到样品以对样品充电之后扫描第二电子束的方法和装置，其中， 使第一电子束的直径大于第二电子束的光束直径。