公开(公告)号：US20210332478A1

公开(公告)日：2021-10-28

申请号：US16615060

申请日：2019-04-15

Applicant: Huazhong University of Science and Technology

Inventor： Rong CHEN ,  Jiawei LI ,  Bin SHAN ,  Xiao LIU ,  Kai QU ,  Jing ZHANG

IPC: C23C16/44 ,  C23C16/52 ,  C23C16/455

Abstract: An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.