公开(公告)号：US3691694A

公开(公告)日：1972-09-19

申请号：US3691694D

申请日：1970-11-02

Applicant: IBM

Inventor： GOETZ FREDERICK E ,  HAUSE JAMES R

IPC: B24B37/08 ,  B24B7/00 ,  B24B9/00 ,  B24B29/00

CPC classification number: B24B37/08

Abstract: This patent relates to apparatus for removing and polishing opposite surfaces of a semiconductor wafer. The apparatus comprises a rotatable platen having an abrasive upper surface upon which a mask having suitable apertures therein for receiving wafers is positioned. A hoop is connected to the mask for imparting rotation thereof separately from the rotation of the platen. Overlying the mask and wafers is a second lapping means having an abrasive surface thereon for applying a uniform pressure upon the opposite surface of the wafer. Separate drive means cooperate with the second lapping means for separately driving the lapping means os that upon rotation of the platen, hoop and mask, and second lapping means the opposite planar surfaces of the wafer is brought into coplanarity while being polished. During the operation of the apparatus the surface of the wafers is continuously wetted with an excess quantity of a displacement plating solution containing, for example, a cupric or silver nitrate and a fluoride anion, the solution being maintained preferably at a pH of less than 7.

Abstract translation: 该专利涉及用于去除和抛光半导体晶片的相对表面的设备。 该装置包括具有磨料上表面的可旋转压盘，定位有用于接收晶片的具有合适孔的掩模。 一个箍连接到掩模上，用于与压板的旋转分开地转动。 覆盖掩模和晶片是第二研磨装置，其上具有用于在晶片的相对表面上施加均匀压力的研磨表面。 单独的驱动装置与第二研磨装置配合，用于单独驱动研磨装置os，当台板，箍和掩模旋转时，和第二研磨装置，晶片的相对的平坦表面在抛光时被共面。 在设备运行期间，晶片的表面用过量的含有例如铜或硝酸银和氟化物阴离子的置换镀液持续润湿，该溶液优选保持在小于7的pH 。

公开(公告)号：US3550325A

公开(公告)日：1970-12-29

申请号：US3550325D

申请日：1968-03-22

Applicant: IBM

Inventor： GOETZ FRED E ,  DRUZBA PERRY R JR ,  HAUSE JAMES R ,  SEELEY GERARD

IPC: B24B37/10 ,  H01L21/304 ,  B24B7/08 ,  B24B25/00

CPC classification number: H01L21/02013 ,  B24B27/0023 ,  B24B37/105

公开(公告)号：US3626640A

公开(公告)日：1971-12-14

申请号：US3626640D

申请日：1970-03-23

Applicant: IBM

Inventor： GOETZ FRED E ,  DRUZBA PERRY R JR ,  HAUSE JAMES R ,  SEELEY GERARD

IPC: B24B37/10 ,  B24B37/04 ,  B24B7/00

CPC classification number: B24B37/105 ,  B24B27/0023

Abstract: THIS DISCLOSURE INCLUDES APPARATUS FOR PREPARING THE SURFACE OF A WORKPIECE. THE DISCLOSURE TEACHES THE PROVISION OF A NOVEL WORKPIECE CARRIER FOR ENGAGING THE WORKPIECE, AND OSCAILLATING THE WORKPIECE HOLDER RELATIVE TO A FINISHING SURFACE WHILE SIMULTANEOUSLY PROVIDING RELATIVE LINEAR MOVEMENT BETWEEN THE WORKPIECE HOLDER AND THE FISHING SURFACE. THE APPARATUS INCLUDES A CARRIER HAVING A DRIVER FOR MOVING THE CARRIER ALONG A LINEAR PATH OF TRAVEL. A ROTABLE MOUNT WHICH IS CARRIED BY THE CARRIER INCLUDES A DEPENDING WORKPIECE RECEIVER WHICH IS ROTABLY CONNECTED TO THE MOUNT, THE RECEIVER BEING MOUNTED ECCENTRICALLY WITH RESPECT TO THE CARRIER. STRUCTURE IS PROVIDED FOR IMPARTING RORATION TO THE MOUNT AND SEPARATE ELEMENTS SUCH AS SPRINGS ARE CONNECTED BETWEEN THE RECEIVER AND THE CARRIER SO AS TO INHIBIT ROTATION OF THE RECEIVER WHILE PERMITTING OSCILATION THEREOF. IN THIS MANNER, AN ARTICLE BEING HELD BY THE RECEIVER MAY BE ENGAGED AND OSCILLATED AGAINST THE FINISHING SURFACE IN SUBSTANTIALLY COPLANAR RELATIONSHIP THEREWITH. IN ADDITION, AS HEREIN DISCLOSED, THE FINISHING TABLE UPON WHICH THE CARRIERS RIDE MAY BE PROVIDED WITH A PLURALITY OF FINISHING SURFACES, EACH ADAPTED FOR DIFFERENT FINISHING OPERATIONS WITH INTERMEDIATE CLEANING SURFACES TO CLEAN THE WORKPIECE OF ANY RESIDE ADHEARING THERETO FROM A PREVIOUS FINISHING SURFACE.

公开(公告)号：US3659386A

公开(公告)日：1972-05-02

申请号：US3659386D

申请日：1970-03-16

Applicant: IBM

Inventor： GOETZ FRED E ,  DRUZBA PERRY R JR ,  HAUSE JAMES R ,  SEELEY GERARD

IPC: B24B37/10 ,  B24B1/00

CPC classification number: B24B37/105 ,  B24B27/0023

Abstract: This patent discloses a method of preparing the surface of a workpiece. The disclosed method teaches the provision of a novel workpiece carrier for engaging the workpiece, and oscillating the workpiece holder relative to a finishing surface while simultaneously providing relative linear movement between the workpiece holder and the finishing surface. The apparatus, by which the method is performed, includes a carrier having drive means for moving the carrier along a linear path of travel. A rotatable mount which is carried by the carrier includes a depending workpiece receiver which is rotatably connected to the mount, the receiver being mounted eccentrically with respect to the carrier. Means are provided for imparting rotation to the mount and separate means such as springs are connected between the receiver and the carrier so as to inhibit rotation of the receiver while permitting oscillation thereof. In this manner, an article being held by the receiver may be engaged and oscillated against the finishing surface in substantially coplanar relationship therewith. In addition, as herein disclosed, the finishing table upon which the carriers ride may be provided with a plurality of finishing surfaces, each adapted for different finishing operations with intermediate cleaning surfaces to clean the workpiece of any residue adhering thereto from a previous finishing surface.

Abstract translation: 该专利公开了一种制备工件表面的方法。 所公开的方法教导了提供用于接合工件的新型工件载体，并且相对于精加工表面摆动工件保持件，同时在工件保持器和精加工表面之间提供相对的线性运动。 执行该方法的装置包括具有用于沿行进路线移动载体的驱动装置的载体。 由托架承载的可旋转安装件包括可旋转地连接到安装座的悬挂工件接收器，接收器相对于托架偏心安装。 提供了用于向安装座施加旋转的装置，并且诸如弹簧之类的分离装置连接在接收器和载体之间，以便禁止接收器的旋转，同时允许其振动。 以这种方式，由接收器保持的物品可以以与其完全共面的关系相对于精加工表面进行接合和摆动。 此外，如本文所公开的那样，载具搭接的精加工台可以设置有多个精加工表面，每个精加工表面适用于具有中间清洁表面的不同的精加工操作，以从先前的精加工表面清洁附着在其上的任何残余物的工件。