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公开(公告)号:US11697907B2
公开(公告)日:2023-07-11
申请号:US17491940
申请日:2021-10-01
申请人: IMEX CO., LTD.
发明人: Kazuma Okamura , Isamu Esashika , Hajime Kambara
CPC分类号: D06P5/006 , D05C11/24 , D05C17/00 , D06P1/16 , D06P5/2055
摘要: Disclosed is a method for producing an embroidery pattern through stitching to a substrate, particularly a method for producing a colored embroidery pattern having color disposition corresponding to a complex shape or stitches, simply and at low cost. The method includes: forming an embroidery base pattern to a substrate by use of single-color embroidery thread; printing a transfer image on an intermediate recording medium having a total light transmittance Tt of 60% or higher by use of a sublimable disperse dye, the transfer image being used for dyeing the embroidery thread of the embroidery base pattern; superposing the transfer image on the embroidery base pattern, while the intermediate recording medium is positioned from the backside of a printed surface of the recording medium; and heat-pressing the intermediate recording medium from the backside of the recording medium, to thereby dye the embroidery thread of the embroidery base pattern.