Chamber for an ionization vacuum gauge

    公开(公告)号:US12154771B2

    公开(公告)日:2024-11-26

    申请号:US18431091

    申请日:2024-02-02

    Applicant: INFICON AG

    Abstract: Chamber (11, 12, 13) for bounding a plasma generation area (42) in a vacuum pressure sensor (40), wherein the chamber comprises an electrically conductive casing element (1, 1′, 1″) located radially on the outside relative to a central axis, wherein the chamber comprises electrically conductive wall elements (2, 2′, 2″) arranged substantially perpendicular to the central axis and connected to the casing element, wherein at least one of the wall elements has a first opening (3), through which the central axis extends, wherein the casing element comprises at least a first (B1) and a second region (B2), wherein the first region is located closer to the central axis than the second region. The invention further relates to a vacuum pressure sensor comprising the chamber.

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