公开(公告)号：US20220379560A1

公开(公告)日：2022-12-01

申请号：US17819279

申请日：2022-08-11

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.

公开(公告)号：US20200180225A1

公开(公告)日：2020-06-11

申请号：US16703417

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/371 ,  B29C64/106

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.

公开(公告)号：US11590701B2

公开(公告)日：2023-02-28

申请号：US17819279

申请日：2022-08-11

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.

公开(公告)号：US20220055302A1

公开(公告)日：2022-02-24

申请号：US17453292

申请日：2021-11-02

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04

Abstract: Methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.

公开(公告)号：US20200180190A1

公开(公告)日：2020-06-11

申请号：US16703423

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C35/02 ,  B29C35/08 ,  B29C59/04

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.

公开(公告)号：US11673328B2

公开(公告)日：2023-06-13

申请号：US17453292

申请日：2021-11-02

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

CPC classification number: B29C64/264 ,  B29C35/0288 ,  B29C35/0805 ,  B29C59/04 ,  B29C64/106 ,  B29C64/245 ,  B29C64/371 ,  B29C2035/0827 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.

公开(公告)号：US11453164B2

公开(公告)日：2022-09-27

申请号：US16703423

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece once the UV material is cured.

公开(公告)号：US11203154B2

公开(公告)日：2021-12-21

申请号：US16703417

申请日：2019-12-04

Applicant: IO Tech Group Ltd.

Inventor： Michael Zenou ,  Ziv Gilan ,  Daniel Liptz ,  Yuval Shai

IPC: B29C64/264 ,  B29C64/245 ,  B29C64/106 ,  B29C64/371 ,  B29C35/02 ,  B29C35/08 ,  B29C59/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00

Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.