公开(公告)号：US20150124236A1

公开(公告)日：2015-05-07

申请号：US14535012

申请日：2014-11-06

Applicant: InnoLux Corporation

Inventor： Cheng-Jui LIN ,  Yu-Ju CHEN ,  Chen-Kuan KAO ,  Chu-Chun CHENG

IPC: G03F7/00

CPC classification number: G03F7/0005 ,  G02F1/1303 ,  G02F1/133788 ,  G03F7/20

Abstract: A light exposure system includes a light source device, a shutter device and a control device. The light source device is capable of emitting a light to an assembly liquid crystal cell. The shutter device is located on an optical path of the light. The control device controls the light source device or the shutter device to control the illuminance on the assembly liquid crystal cell. The control device makes the assembly liquid crystal cell have a plurality of first exposure times receiving a first illuminance and a plurality of second exposure times receiving a second illuminance during the light exposure process. The first exposure times and the second exposure times are arranged alternately. The sum of the first exposure times and the second exposure times is substantially equal to the default continuous exposure time.

Abstract translation: 曝光系统包括光源装置，快门装置和控制装置。 光源装置能够将光发射到组装液晶单元。 快门装置位于光的光路上。 控制装置控制光源装置或快门装置以控制装配液晶盒上的照度。 控制装置使得组装液晶单元在曝光过程中具有接收第一照度的多个第一曝光时间和接收第二照度的多个第二曝光时间。 第一曝光时间和第二曝光时间交替排列。 第一曝光时间和第二曝光时间之和基本上等于默认的连续曝光时间。