公开(公告)号：US20250004380A1

公开(公告)日：2025-01-02

申请号：US18215427

申请日：2023-06-28

Applicant: Intel Corporation

Inventor： Joseph BLOXHAM ,  Jeremy D. ECTON

IPC: G03F7/30

Abstract: Devices, systems, and methods for conditioning a solvent return flow from a photolithographic process used for semiconductor processing are presented. Reuse of materials in semiconductor processing can provide environmental and manufacturing cost advantages. Devices for conditioning a solvent return flow from a photolithographic process and systems for photolithographic processes include a baffle system and a light system. Methods for reusing a solvent from a photolithographic process include passing the solvent through a conditioning device having a baffle system and a light system.