公开(公告)号：US20190385300A1

公开(公告)日：2019-12-19

申请号：US16557782

申请日：2019-08-30

Applicant: Intel Corporation

Inventor： Bikram Baidya ,  Hale Erten ,  Allan Gu ,  John A. Swanson ,  Vivek K. Singh ,  Abde Ali Hunaid Kagalwalla ,  Mengfei Yang-Flint

IPC: G06T7/00 ,  G06T3/00 ,  G06T7/60 ,  G06N20/00

Abstract: A method includes identifying a first geometric pattern that failed a design rule check, identifying a second geometric pattern that passed the design rule check, morphing the first geometric pattern based on the second geometric pattern to generate a morphed geometric pattern, wherein the morphed geometric pattern passes the design rule check, and replacing the first geometric pattern with the morphed geometric pattern.

公开(公告)号：US11301982B2

公开(公告)日：2022-04-12

申请号：US16557782

申请日：2019-08-30

Applicant: Intel Corporation

Inventor： Bikram Baidya ,  Hale Erten ,  Allan Gu ,  John A. Swanson ,  Vivek K. Singh ,  Abde Ali Hunaid Kagalwalla ,  Mengfei Yang-Flint

IPC: G06T7/00 ,  G06T3/00 ,  G06N20/00 ,  G06T7/60

Abstract: A method includes identifying a first geometric pattern that failed a design rule check, identifying a second geometric pattern that passed the design rule check, morphing the first geometric pattern based on the second geometric pattern to generate a morphed geometric pattern, wherein the morphed geometric pattern passes the design rule check, and replacing the first geometric pattern with the morphed geometric pattern.