公开(公告)号：US20210143100A1

公开(公告)日：2021-05-13

申请号：US16681164

申请日：2019-11-12

Applicant: Intel Corporation

Inventor： Nanda Kumar Chakravarthi ,  Kwame Nkrumah Eason ,  Abhinav Tripathi ,  Ebony Lynn Mays ,  Jessica Sevanne Kachian ,  Ralf Buengener

IPC: H01L23/535 ,  H01L27/11556 ,  H01L27/11582 ,  H01L23/522 ,  H01L23/528 ,  H01L21/768

Abstract: A memory array including integrated word line (WL) contact structures are disclosed. The memory array comprises a plurality of WLs that includes at least a first WL and a second WL. An integrated WL contact structure includes a first WL contact and a second WL contact for the first WL and the second WL, respectively. The second WL contact extends through the first WL contact. For example, the second WL contact is nested within the first WL contact. An intervening isolation material isolates the second WL contact from the first WL contact. In an example, the second WL contact extends through a hole in the first WL to reach the second WL. The isolation material isolates the second WL contact from sidewalls of the hole in the first WL.

公开(公告)号：US20230402389A1

公开(公告)日：2023-12-14

申请号：US18235766

申请日：2023-08-18

Applicant: Intel Corporation

Inventor： Nanda Kumar Chakravarthi ,  Kwame Nkrumah Eason ,  Abhinav Tripathi ,  Ebony Lynn MAYS ,  Jessica Sevanne Kachian ,  Ralf Buengener

IPC: H01L23/535 ,  H01L21/768 ,  H01L23/528 ,  H01L23/522 ,  H10B41/27 ,  H10B43/27

CPC classification number: H01L23/535 ,  H01L21/76895 ,  H01L23/5283 ,  H01L21/76805 ,  H01L23/5226 ,  H10B41/27 ,  H10B43/27

Abstract: A memory array including integrated word line (WL) contact structures are disclosed. The memory array comprises a plurality of WLs that includes at least a first WL and a second WL. An integrated WL contact structure includes a first WL contact and a second WL contact for the first WL and the second WL, respectively. The second WL contact extends through the first WL contact. For example, the second WL contact is nested within the first WL contact. An intervening isolation material isolates the second WL contact from the first WL contact. In an example, the second WL contact extends through a hole in the first WL to reach the second WL. The isolation material isolates the second WL contact from sidewalls of the hole in the first WL.