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公开(公告)号：US20250004387A1
公开(公告)日：2025-01-02
申请号：US18215485
申请日：2023-06-28
Applicant: Intel Corporation
Inventor： Yongbae KIM
Abstract: Devices and processes for managing electrostatic charge on lithographic photomasks for semiconductor fabrication are provided. Exemplary devices include sensors for measuring the electrostatic charge on a lithographic photomask and charge injectors for modifying the electrostatic charge on a lithographic photomask. Exemplary devices are capable of attaching to carriers for lithographic photomasks. Exemplary processes include measuring the electrostatic charge on a lithographic photomask, calculating the amount that the electrostatic charge should be increased or decreased, and modifying the amount of electrostatic charge.
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公开(公告)号：US20250102903A1
公开(公告)日：2025-03-27
申请号：US18373485
申请日：2023-09-27
Applicant: Intel Corporation
Inventor： Yongbae KIM
Abstract: Provided is a pellicle assembly that is sufficiently conductive in cooperation with a photomask that is mounted to the pellicle assembly to protect the pellicle and mask from electro static discharge.
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