Method for preparing a photo-crosslinkable composition
    1.
    发明授权
    Method for preparing a photo-crosslinkable composition 有权
    光可交联组合物的制备方法

    公开(公告)号:US08574818B2

    公开(公告)日:2013-11-05

    申请号:US12936458

    申请日:2009-04-09

    IPC分类号: G03F7/004 G03F7/30 G03F7/38

    摘要: The invention relates to a photo-crosslinkable composition obtainable by a method comprising: (a) the hydrolysis and condensation reaction of a [(epoxycycloalkyl)alkyl]trialkoxysilane in solution in an organo-aqueous medium as described in specification to obtain a solution of an organo-mineral hybrid prepolymer, in which the totality or quasi-totality of the alkoxysilane groups has been hydrolysed, and which comprises in average at least 4 (epoxycycloalkyl)alkyl groups; (b) cooling the obtained polyepoxide prepolymer composition as described in specification: (c) adding to said composition at least one cationic-polymerisation photo-photoinitiator and at least one specific photosensitiser as describes in specification and adding a surfactant; (d) agitating the obtained composition as described in specification thus obtained; (e) filtering the obtained composition as described in specification thus obtained; and (f) storing the obtained liquid filtrate as described in specification thus obtained. The invention also relates to the a photocrosslinkable composition as a negative photosensitive resin in a photolithography process.

    摘要翻译: 本发明涉及一种可光交联组合物,其可通过以下方法获得,该方法包括:(a)[(环氧环烷基)烷基]三烷氧基硅烷在有机水介质中的溶液中的水解和缩合反应,如说明书所述,以获得 有机 - 矿物杂化预聚物,其中烷氧基硅烷基团的总体或准总数已被水解,并且平均包含至少4个(环氧环烷基)烷基; (b)按照说明书所述冷却得到的聚环氧化物预聚物组合物:(c)向所述组合物中加入至少一种阳离子聚合光引发剂和至少一种如说明书中所述的特定光敏剂并加入表面活性剂; (d)如所得的说明书所述搅拌得到的组合物; (e)按照如此得到的说明书所述过滤所得组合物; 和(f)如所得的说明书所述储存所得的液体滤液。 本发明还涉及在光刻工艺中作为负型感光性树脂的光致交联组合物。

    METHOD FOR PREPARING A PHOTO-CROSSLINKABLE COMPOSITION
    2.
    发明申请
    METHOD FOR PREPARING A PHOTO-CROSSLINKABLE COMPOSITION 有权
    制备光致可交联组合物的方法

    公开(公告)号:US20110033802A1

    公开(公告)日:2011-02-10

    申请号:US12936458

    申请日:2009-04-09

    IPC分类号: G03F7/20 G03F7/004

    摘要: The invention relates to a photo-crosslinkable composition that can be obtained by a method including the following steps: (a) the hydrolysis and condensation reaction of a [(epoxycycloalkyl)alkyl]thalkoxysilane in solution in an organo-aqueous medium containing water in an initial water/monomer molar ratio of between 3 and 15, with at least one water-soluble solvent, at a pH of between 1.6 and 4.0, by heating the solution to a temperature of between 50 and 70° C. for a duration of between 180 and 350 minutes in order to obtain a solution of an organo-mineral hybrid prepolymer, in which the totality or quasi-totality of the alkoxysilane groups has been hydrolysed, and which comprises in average at least 4 (epoxycycloalkyl)alkyl groups; (b) cooling the polyepoxide prepolymer composition thus obtained down to a temperature of between 15 and 25° C.; (c) adding to said composition at least one cationic-polymerisation photo-primer and at least one photosensitiser having a maximum absorption at a wavelength of between 300 and 420 nm, and optionally adding a surfactant; (d) agitating the composition thus obtained for a duration of between 10 and 120 minutes at a temperature of between 15 and 25° C.; (e) filtering the composition thus obtained with a filter comprising pores with an average size of between 1 and 5 μm; and (f) storing the liquid filtrate thus obtained at a temperature lower than 0° C., preferably between −20 and −10° C. The invention also relates to the use of such a photocrosslinkable composition as a negative photosensitive resin in a photolithography process.

    摘要翻译: 本发明涉及可通过包括以下步骤的方法获得的光可交联组合物:(a)[(环氧环烷基)烷基]二烷氧基硅烷在含有水的有机水介质中的溶液中的水解和缩合反应 通过将溶液加热至50至70℃之间的温度,将介于3和15之间的初始水/单体摩尔比与至少一种水溶性溶剂在pH值介于1.6和4.0之间, 180和350分钟,以获得其中烷氧基硅烷基团的全部或全部总数已被水解并且平均包含至少4个(环氧环烷基)烷基的有机 - 矿物杂化预聚物的溶液; (b)将由此获得的聚环氧化物预聚物组合物冷却至15至25℃的温度; (c)向所述组合物中加入至少一种阳离子聚合光引物和至少一种在波长在300和420nm之间具有最大吸收的光敏剂,以及任选加入表面活性剂; (d)在15至25℃之间的温度下将由此获得的组合物搅拌10至120分钟; (e)用包含平均尺寸在1和5μm之间的孔的过滤器过滤由此获得的组合物; 和(f)在低于0℃,优选-20至-10℃的温度下储存由此获得的液体滤液。本发明还涉及这种光致交联组合物作为负光敏树脂在光刻中的用途 处理。