公开(公告)号：US08854410B2

公开(公告)日：2014-10-07

申请号：US13214889

申请日：2011-08-22

申请人： Jiro Minabe ,  Keishi Shimizu ,  Mihoko Wakui ,  Yasuhiro Ogasawara ,  Kazuhiro Hayashi ,  Akira Tateishi ,  Shin Yasuda ,  Motoki Taniguchi

发明人： Jiro Minabe ,  Keishi Shimizu ,  Mihoko Wakui ,  Yasuhiro Ogasawara ,  Kazuhiro Hayashi ,  Akira Tateishi ,  Shin Yasuda ,  Motoki Taniguchi

IPC分类号： B41J15/14 ,  B41J27/00 ,  G02B5/32 ,  G03G15/043 ,  G03G15/04

CPC分类号： G03G15/04054 ,  G03G15/0435

摘要： An exposure device includes at least one light emitting element that emits light in a normal direction of the substrate; at least one hologram element that is recorded on a recording layer arranged on the substrate to diffract light emitted from the light emitting element and condense the diffracted light on a condensing point on a normal line of the light emitting element; and at least one light inhibiting part that is arranged on a straight line that connects the light emitting element and the condensing point such that the light diffracted by the hologram element passes through the outside of the light inhibiting part and condenses at the condensing point, to inhibit transmission of zeroth-order light that goes straight toward the condensing point from the light emitting element without being diffracted by the hologram element.

摘要翻译： 曝光装置包括：在基板的法线方向上发光的至少一个发光元件; 至少一个全息元件，其被记录在布置在所述基板上的记录层上，以衍射从所述发光元件发射的光并将所述衍射光冷凝在所述发光元件的法线上的聚光点上; 以及至少一个光抑制部，其布置在连接发光元件和聚光点的直线上，使得由全息元件衍射的光穿过光抑制部分的外部并在聚光点处冷凝至至 抑制从发光元件直接朝向聚光点传播的零级光的透射，而不被全息元件衍射。