公开(公告)号：US06650399B2

公开(公告)日：2003-11-18

申请号：US10073119

申请日：2002-02-12

申请人： Johannes Jacobus Matheus Baselmans ,  Marco Hugo Petrus Moers ,  Hans Van Der Laan ,  Robert Wilhelm Willekers ,  Wilhelmus Petrus De Boeij ,  Marcus Adrianus Van De Kerkhof

发明人： Johannes Jacobus Matheus Baselmans ,  Marco Hugo Petrus Moers ,  Hans Van Der Laan ,  Robert Wilhelm Willekers ,  Wilhelmus Petrus De Boeij ,  Marcus Adrianus Van De Kerkhof

IPC分类号： G03B2742

CPC分类号： G01M11/0264 ,  G01M11/0285 ,  G03F7/706

摘要： A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave front aberrations of the projection system, characterized in that the interferometric measurement system including: a grating, featuring a grating pattern in a grating plane, said grating being movable into and out of the projection beam, such that the grating plane is substantially coincident with said object plane; a pinhole, featuring a pinhole pattern in a pinhole plane and arranged in a pinhole plate, said pinhole being movable into and out of the projection beam, such that the pinhole plane is substantially coincident with a plane downstream of the projection system and optically conjugate to said object plane, and a detector with a detector surface substantially coincident with a detection plane, said detection plane located downstream of the pinhole at a location where a spatial distribution of the electric field amplitude of the projection beam is substantially a Fourier transformation of a spatial distribution of the electric field amplitude of the projection beam in the pinhole plane.

摘要翻译： 一种光刻投影装置，包括照明系统; 用于保持面罩的支撑结构; 用于保持衬底的衬底台; 投影系统，用于将图案投影到所述基板的目标部分上; 以及用于测量所述投影系统的波前像差的干涉测量系统，其特征在于，所述干涉测量系统包括：光栅，其特征在于光栅平面中的光栅图案，所述光栅可移入和移出所述投影光束，使得 光栅平面基本上与所述物平面重合; 针孔，其具有针孔平面中的针孔图案并且布置在针孔板中，所述针孔可移动进入和离开投影梁，使得针孔平面基本上与投影系统的下游平面重合，并且与光学共轭 所述物体平面和检测器表面基本上与检测平面重合的检测器，所述检测平面位于所述针孔的下游，所述位置处投影光束的电场振幅的空间分布基本上是空间的傅立叶变换 投影光束在针孔平面中的电场振幅分布。