Particle detection on patterned wafers and the like
    1.
    发明授权
    Particle detection on patterned wafers and the like 失效
    图案化晶片上的粒子检测等

    公开(公告)号:US4898471A

    公开(公告)日:1990-02-06

    申请号:US248309

    申请日:1988-09-19

    IPC分类号: G01N21/94 G01N21/956

    摘要: A particle detection on a periodic patterned surface is achieved in a method and apparatus using a single light beam scanning at a shallow angle over the surface. The surface contains a plurality of identical die with streets between die. The beam scans parallel to a street direction, while a light collection system collects light scattered from the surface with a constant solid angle. The position of the collection system as well as the polarization of the light beam and collected scattered light may be arranged to maximize the particle signal compared to the pattern signal. A detector produces an electrical signal corresponding to the intensity of scattered light that is colelcted. A processor constructs templates from the electrical signal corresponding to individual die and compares the templates to identify particles. A reference template is constantly updated so that comparisons are between adjacent die. In one embodiment, the templates are made up of registered positions where the signal crosses a threshold, and the comparison is between corresponding positions to eliminate periodic pattern features, leaving only positions representing particles.

    摘要翻译: 在使用在表面上以浅角度扫描的单个光束的方法和装置中实现周期性图案化表面上的粒子检测。 表面包含多个相同的模具,在模具之间具有街道。 光束平行于街道方向扫描,而光采集系统以恒定立体角收集从表面散射的光。 收集系统的位置以及光束和收集的散射光的偏振可以被布置成与图案信号相比最大化粒子信号。 检测器产生对应于被烧焦的散射光的强度的电信号。 处理器从对应于各个管芯的电信号构建模板,并比较模板以识别粒子。 参考模板不断更新,以便相邻模具之间进行比较。 在一个实施例中,模板由信号跨越阈值的注册位置组成,并且在相应位置之间进行比较以消除周期性图案特征,仅留下表示粒子的位置。