公开(公告)号：US06055150A

公开(公告)日：2000-04-25

申请号：US188038

申请日：1998-11-06

申请人： Jon Clinton ,  Mark Contreras ,  Anand H. Kumar ,  Shamouil Shamouilian ,  You Wang ,  Surinder Bedi

发明人： Jon Clinton ,  Mark Contreras ,  Anand H. Kumar ,  Shamouil Shamouilian ,  You Wang ,  Surinder Bedi

IPC分类号： H01L21/683 ,  H02N13/00

CPC分类号： H01L21/6833 ,  Y10T279/23

摘要： A failure resistant electrostatic chuck 20 for holding a substrate 35 during processing of the substrate 35 comprises one or more electrodes 25 covered by an insulator 30, the electrodes 25 capable of electrostatically holding a substrate 35 when a voltage is applied thereto. An electrical power bus 40 comprises one or more output terminals 45 that conduct voltage to the electrodes 25. The fuses 50 are positioned in hollow cavities 55 in the insulator 30, and electrically connect the electrodes 25 in series to the output terminals 45 of the power bus 40. Each fuse 50 can electrically disconnect an electrode 25 from an output terminal 45 when the insulator 30 covering the electrode 25 punctures and exposes the electrode 25 to a plasma process environment thereby causing a plasma current discharge to flow through the fuse 50.

摘要翻译： 用于在基板35的处理期间保持基板35的耐破坏静电卡盘20包括由绝缘体30覆盖的一个或多个电极25，当施加电压时能够静电保持基板35的电极25。 电力总线40包括向电极25传导电压的一个或多个输出端子45.保险丝50定位在绝缘体30中的空腔55中，并将电极25串联电连接到电源的输出端子45 总线40.当覆盖电极25的绝缘体30刺穿并将电极25暴露于等离子体处理环境时，每个保险丝50可以将电极25与输出端子45电断开，从而使等离子体电流放电流过保险丝50。