公开(公告)号：US06436546B1

公开(公告)日：2002-08-20

申请号：US09607632

申请日：2000-06-30

申请人： Josephus Gertudis Wilhelmus Pierre Gulikers ,  Peter Malobabic ,  Erwin Hochreiter ,  Klaus Goedicke ,  Jörn-Steffen Liebig

发明人： Josephus Gertudis Wilhelmus Pierre Gulikers ,  Peter Malobabic ,  Erwin Hochreiter ,  Klaus Goedicke ,  Jörn-Steffen Liebig

IPC分类号： C23C1400

CPC分类号： C23C14/0015 ,  C23C14/0042 ,  C23C14/025 ,  C23C14/083 ,  C23C14/505 ,  C23C14/56 ,  Y10T428/24273 ,  Y10T428/2495

摘要： The invention discloses a method for coating foil comprised of nickel or a nickel alloy by sputtering a layer comprised of a metal compound on the foil in a vacuum. The foil is treated in an argon plasma with a pressure of 1031 3 to 10−2 millibar, for a variable time with a variable rate, and with energy of the plasma ions. A chromium oxide layer or a layer containing chromium oxide is successively sputtered by means of a reactive magnetron atomizing of at least one target comprised of chromium or an alloy containing chromium. The layer is sputtered with at least one atomization source in an argon-oxygen mixture with a pressure of 10−3 to 10−2 millibar. The operating point is constantly maintained in given boundaries and the foil is bonded in a defined thermal contact with a thermal buffer when the foil is being coated. The foil is coated until a given interference color pertaining to an interference of a first or second order is reached on the foil.

摘要翻译： 本发明公开了一种通过在真空中将由金属化合物构成的层溅射在箔上的由镍或镍合金组成的箔的方法。 箔片在氩等离子体中以1031 3至10-2毫巴的压力处理，具有可变速率和等离子体离子的能量。 通过至少一种由铬或含有铬的合金构成的靶的反应性磁控管雾化，依次溅射氧化铬层或含有氧化铬的层。 该层在氩气 - 氧气混合物中用10-3至10-2毫巴的压力溅射至少一个雾化源。 工作点始终保持在给定的边界上，并且当箔被涂覆时，箔以热定型的热接触结合。 涂覆箔，直到在箔上达到与第一或第二顺序的干涉有关的给定干涉色。