Lookup table initialization
    1.
    发明授权
    Lookup table initialization 失效
    查找表初始化

    公开(公告)号:US4751446A

    公开(公告)日:1988-06-14

    申请号:US805838

    申请日:1985-12-06

    CPC分类号: G09G5/06

    摘要: In a display system for a data processing system color words for display at sequential pixels are obtained by addressing a lookup table memory with addresses obtained from a bit map display memory. Initialization data is stored in the display memory and, during an initialization procedure, is applied to the lookup table along the same data path used by the addresses during display. In one system a multiplexer takes the form of a shift register into which sequential pixel addresses are applied in parallel to interleaved stages. The two LUT addresses are read out sequentially by shifting the shift register. During the initialization procedure shifting is disabled and the interleaved address and data bytes are applied along separate address and data lines to the lookup table. One data path can be utilized for either eight plane or four plane display. In another system, a buffer storage is provided between the address input to the LUT memory and the data input and, during the initialization procedure, data is stored in the buffer in alternate cycles of the display memory output.

    摘要翻译: 在用于数据处理系统的显示系统中,通过用从位图显示存储器获得的地址寻址查找表存储器来获得用于在顺序像素处显示的彩色字。 初始化数据存储在显示存储器中,并且在初始化过程期间,沿着显示期间地址使用的相同数据路径将其应用于查找表。 在一个系统中,多路复用器采用移位寄存器的形式,顺序像素地址并行地应用于交错级。 通过移位移位寄存器顺序读出两个LUT地址。 在初始化过程中,移位被禁用,交错地址和数据字节沿单独的地址和数据线应用到查找表。 一个数据路径可以用于八个平面显示器或四个平面显示器。 在另一系统中,在LUT存储器的地址输入和数据输入之间提供缓冲存储器,并且在初始化过程期间,数据以显示存储器输出的替代周期存储在缓冲器中。

    Electron optics for multi-beam electron beam lithography tool
    2.
    发明授权
    Electron optics for multi-beam electron beam lithography tool 失效
    多光束电子束光刻工具的电子光学

    公开(公告)号:US06617587B2

    公开(公告)日:2003-09-09

    申请号:US10243585

    申请日:2002-09-12

    IPC分类号: H01J37147

    摘要: A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.

    摘要翻译: 本文公开了一种能够在高通量,多列,多光束电子束光刻系统中使用的电荷粒子光学列。 该柱具有以下特性:纯静电成分; 小柱占地面积(20平方米); 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。 公开了一种电子枪,其使用微制造的场致发射源和微制造的孔径偏转器组件。 孔径偏转器组件用作聚焦,转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。 可以使用门控信号进行光束消隐,以减少在晶片上写入期间的光束模糊。