公开(公告)号：US20210115192A1

公开(公告)日：2021-04-22

申请号：US17135809

申请日：2020-12-28

Applicant: KANEKA CORPORATION

Inventor： Takahiro Yasumoto ,  Dong Zhang ,  Hiroyuki Ushiro ,  Yasutaka Kondo ,  Kohei Ogawa ,  Masahiro Miyamoto

IPC: C08G73/10 ,  C08L79/08

Abstract: A polyimide resin has an acid dianhydride-derived structure and a diamine-derived structure, the acid dianhydride contains an acid dianhydride represented by the general formula (1) and a fluorine-containing aromatic acid dianhydride, and the diamine contains a fluoroalkyl-substituted benzidine. In the general formula (1), n is an integer of 1 or more, and R1 to R4 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or a perfluoroalkyl group having 1 to 20 carbon atoms. The content of the acid dianhydride represented by the general formula (1) may be 10 to 65 mol %, and the content of the fluorine-containing aromatic acid dianhydride may be 30 to 80 mol %, based on 100 mol % of the total of the acid dianhydride.

公开(公告)号：US10851180B2

公开(公告)日：2020-12-01

申请号：US15766265

申请日：2016-10-06

Applicant: KANEKA CORPORATION

Inventor： Ryutaro Mukai ,  Hiroto Koma ,  Takahiro Yasumoto ,  Katsuya Fujisawa ,  Tomohiro Abo

IPC: C08B15/05 ,  C08J5/18 ,  B29C55/06 ,  C08B13/00 ,  B29C55/00 ,  G02B5/30 ,  C08B3/08 ,  B29K1/00 ,  B29L31/34 ,  B29L11/00

Abstract: Provided is a polymer material containing at least one kind of a cellulose derivative having (a) an organosilyl group (the organosilyl group having a first aliphatic group, an unsaturated aliphatic group, or an aromatic group), and (b) an acyl group or a second aliphatic group.

公开(公告)号：US20200025989A1

公开(公告)日：2020-01-23

申请号：US16583814

申请日：2019-09-26

Applicant: KANEKA CORPORATION

Inventor： Ryutaro MUKAI ,  Hiroto Koma ,  Shinsuke Akao ,  Takahiro Yasumoto ,  Tomohiro Abo

IPC: G02B5/30 ,  C08J5/18

Abstract: Provided are: a novel retardation film which has low photoelastic coefficient, while having good linear thermal expansion coefficient and water absorption; and the novel retardation film which additionally has high heat resistance. The above-described problem is solved by a retardation film which has an absolute value of the linear thermal expansion coefficient of 100 ppm/° C. or less, a glass transition temperature of 180° C. or more, a photoelastic coefficient of from 5×10−12 m2/N to 30×10−12 m2/N and a water absorption of 2.0 wt % or less, or a retardation film which has an absolute value of the linear thermal expansion coefficient of 100 ppm/° C. or less, a photoelastic coefficient of from 5×10−12 m2/N to 30×10−12 m2/N and a water absorption of 2.0 wt % or less.