公开(公告)号：US20200294832A1

公开(公告)日：2020-09-17

申请号：US16748834

申请日：2020-01-22

Applicant: KCTECH CO., LTD.

Inventor： DONG MIN KIM

IPC: H01L21/677 ,  B24B57/02

Abstract: The present disclosure relates to a substrate processing apparatus, and more specifically, to a substrate processing apparatus capable of blocking the introduction of external air and external particles into a chamber by forming an air curtain at a loading/unloading part when the chamber is open.The substrate processing apparatus of the present disclosure includes a chamber in which a space is formed, and a fluid injection part configured to inject a fluid from an outer side of a substrate loading/unloading part of the chamber through which a substrate is loaded and unloaded.