公开(公告)号：US10527952B2

公开(公告)日：2020-01-07

申请号：US15576602

申请日：2017-10-24

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Jordan Pio ,  Alexander Svizher

IPC: G03F7/20 ,  H01L23/544 ,  H01L21/66

Abstract: Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.

公开(公告)号：US20180373167A1

公开(公告)日：2018-12-27

申请号：US15576602

申请日：2017-10-24

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Jordan Pio ,  Alexander Svizher

IPC: G03F7/20

Abstract: Scatterometry overlay targets and measurement methods are provided, which are configured to detect and eliminate process-related errors and illumination-related errors from overlay measurements of the targets. Targets comprise at least three cells associated with a measurement direction, wherein at least two of the cells comprise periodic structures at different target layers, having a same pitch and opposite offsets between the two cells, and at least an additional cell comprises a periodic structure with the same pitch at only one of the target layers. The additional cell(s) are used to detect irregularities in the respective periodic structure(s), enable estimation of process quality, provide reference images, enhance metrology simulations and provide mitigation of errors in critical process steps. Measurement methods incorporate scatterometry measurements ion the additional cell(s) for these purposes.