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公开(公告)号:US09666821B2
公开(公告)日:2017-05-30
申请号:US14754941
申请日:2015-06-30
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Joon-Suh Park , Il Ki Han , Ji Hoon Kyhm
CPC classification number: H01L51/502 , H01L51/0014
Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, which includes: forming a first photoresist pattern on a substrate; activating a surface of the substrate having the first photoresist pattern formed thereon; forming a first quantum dot layer on the activated substrate; generating a first quantum dot pattern by removing the first photoresist pattern; and generating a second quantum dot pattern on the same layer as the first quantum dot pattern generated on the substrate. Accordingly, various kinds of quantum dots may be easily implemented at a single substrate.
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公开(公告)号:US09818943B2
公开(公告)日:2017-11-14
申请号:US15495883
申请日:2017-04-24
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Joon-Suh Park , Il Ki Han , Ji Hoon Kyhm
CPC classification number: H01L51/0016 , H01L51/0003 , H01L51/0014 , H01L51/0096 , H01L51/502 , H01L51/5036 , H01L51/56
Abstract: Disclosed is a method of manufacturing a multicolor quantum dot pattern, the forming of a first quantum dot layer on the activated substrate includes: coating a polymer with a polarity opposite to a surface charge of the activated substrate or coating quantum dots having a functional group charged with a polarity opposite to a surface charge of the activated substrate onto the substrate; washing the substrate with water having pH 6 to pH 8; drying the substrate with flow of nitrogen, argon or air; coating quantum dots having a functional group charged with a polarity opposite to the polymer or the quantum dots charge coated on the substrate, or coating a polymer with a polarity opposite to the quantum dots charge coated on the substrate; washing the substrate with water having pH 6 to pH 8; and drying the substrate with flow of nitrogen, argon or air.
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