公开(公告)号：US20140147684A1

公开(公告)日：2014-05-29

申请号：US14090524

申请日：2013-11-26

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Soonjong KWAK ,  Jae Ho JUN ,  Ju Young YOOK

IPC: C09D5/00 ,  H01L23/29

CPC classification number: C09D5/00 ,  C08G77/24 ,  C09D4/00 ,  C09D183/08 ,  H01L23/296 ,  H01L2924/0002 ,  Y10T428/31663 ,  H01L2924/00

Abstract: Provided are a gas barrier film that is simply and economically manufactured, and has high hardness and strength, excellent gas blocking properties, controllable refraction index and transparency, and a compositionally gradient structure, and a method of producing the same. The gas barrier film includes a base material; and an organic/inorganic hybrid gas barrier layer that is formed on the base material and has a composition-gradient structure. The organic/inorganic hybrid gas barrier layer has a network structure having —O—Si—O— linkages. The network structure contains an organic functional group having a carbon atom directly linked to a silicon atom of the —O—Si—O— linkages, and other element that exists in an oxide form in the interstitial location of the network structure or that is linked to an oxygen atom of the —O—Si—O— linkages, wherein the other element comprises at least one selected from alkali metal, alkaline earth metal, transition metal, post transition metal, metalloid, boron, and phosphorous.

Abstract translation: 提供简单且经济地制造的阻气膜，并且具有高硬度和强度，优异的气体阻隔性能，可控折射率和透明度以及组成梯度结构及其制备方法。 阻气膜包括基材; 以及形成在基材上并具有组成梯度结构的有机/无机混合气体阻隔层。 有机/无机混合气体阻隔层具有具有-O-Si-O-键的网络结构。 网络结构包含具有直接连接到-O-Si-O-键的硅原子的碳原子的有机官能团，以及以网状结构的间隙位置存在的氧化物形式的其它元素或连接 涉及-O-Si-O-键的氧原子，其中另一元素包括选自碱金属，碱土金属，过渡金属，过渡金属，准金属，硼和磷中的至少一种。