公开(公告)号：US20240101810A1

公开(公告)日：2024-03-28

申请号：US17768986

申请日：2020-09-04

Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY

Inventor： Eun Ho SOHN ,  Shin Hong YOOK ,  Hong Suk KANG ,  In Joon PARK ,  Sang Goo LEE ,  Soo Bok LEE ,  Won Wook SO ,  Hyeon Jun HEO ,  Dong Je HAN ,  Seon Woo KIM

IPC: C08L33/16 ,  C09D133/16

CPC classification number: C08L33/16 ,  C09D133/16

Abstract: The present invention relates to a composition for forming a composite polymer film, a method for preparing the composition for forming a composite polymer film, a composite polymer film and a method for preparing the composite polymer film. The composition for forming a composite polymer film comprises: a fluorine-based polymer solution comprising a fluorine-based polymer; and polyvinylidene fluoride nanoparticles dispersed in the fluorine-based polymer solution. The method for preparing the composition for forming a composite polymer film comprises the steps of: preparing a fluorine-based polymer solution comprising a fluorine-based polymer; and dispersing polyvinylidene fluoride nanoparticles in the fluorine-based polymer solution. The composite polymer film comprises: a polymer matrix formed from a fluorine-based polymer; and polyvinylidene fluoride nanoparticles dispersed in the polymer matrix. The method for preparing the composite polymer film comprises the steps of: preparing a fluorine-based polymer solution comprising a fluorine-based polymer; preparing a composition, for forming a composite polymer film, by dispersing polyvinylidene fluoride nanoparticles in the fluorine-based polymer solution; and forming the composite polymer film by applying the composition for forming a composite polymer film.

公开(公告)号：US20250084196A1

公开(公告)日：2025-03-13

申请号：US18580684

申请日：2022-07-04

Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY

Inventor： Eun-Ho SOHN ,  Won Wook SO ,  In Joon PARK ,  Bong Jun CHANG ,  Hong Suk KANG ,  Ju Hyeon KIM ,  Ji Hoon BAIK ,  Sang Goo LEE ,  Hyeon Jun HEO ,  Shin Hong YOOK ,  Dong Je HAN ,  Ji Young LEE

IPC: C08F220/14 ,  C08F220/22 ,  C08J5/18

Abstract: An aspect of the present invention is to provide a fluorine-based polymer showing a significantly low dielectric constant of less than 1.8 and a fluorine-based polymer composition including the same. The fluorine-based polymer provided in an aspect of the present invention shows a very low dielectric constant, wherein the polymer is not only a pollution-reducing material generating no harmful substance, but may also be utilized as a coating material in various fields due to high adhesiveness. Furthermore, a polymer film employing the polymer as a material has a volume resistance of about 5.8×1015 Ohmcm, showing an excellent resistance value as an insulating material.