公开(公告)号：US20210285756A1

公开(公告)日：2021-09-16

申请号：US16957801

申请日：2020-02-27

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Young-Sik GHIM ,  Hyug-gyo RHEE

IPC: G01B11/06 ,  G01J3/02 ,  G01N21/41 ,  G02B27/28

Abstract: In the embodiment in association with the present disclosure, an apparatus and method for multilayer thin film thickness measurement using single-shot angle-resolved spectral reflectometry are provided which allow simultaneously obtaining the absolute reflectance and phase data of a measurement object over a broad wavelength range and wide incident angle according to various polarization states by a single-shot measurement.