公开(公告)号：US20180118908A1

公开(公告)日：2018-05-03

申请号：US15534828

申请日：2016-04-06

申请人： KPX CHEMICAL CO., LTD.

发明人： Seung-Geun KIM ,  Hak-Su KANG ,  Jeong-Seon CHOO ,  Dae-Han JUNG ,  Gi-Young PARK

IPC分类号： C08J9/06 ,  C08G18/48 ,  C08G18/76 ,  B29C44/34 ,  B29C44/56 ,  B29C69/00

摘要： A method of manufacturing a polishing pad includes producing an urethane prepolymer having a viscosity of 20,000 cps (at 25° C.) to 40,000 cps (at 25° C.) by mixing a plurality of polymers, mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60° C. to 150° C., and manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.