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公开(公告)号:US07959492B2
公开(公告)日:2011-06-14
申请号:US11898273
申请日:2007-09-11
申请人: Kazuyuki Haneda , Kunizo Watanabe , Yosuke Sato
发明人: Kazuyuki Haneda , Kunizo Watanabe , Yosuke Sato
IPC分类号: B24B1/00
CPC分类号: B24B5/06 , B24B9/08 , B24B29/005 , B24B29/04 , B24D13/10 , G11B5/8404
摘要: The disk-shaped substrate inner circumference polishing method for polishing an inner circumference of a disk-shaped substrate including a portion having an opening hole at the center thereof includes inserting a brush having a shaft core into the portion having the opening hole of the disk-shaped substrate; fixing one end and the other end of the brush to a pair of rotating shafts that are provided at mutually detached positions and pulling at least any one of the one end and the other end of the brush and applying tension in the axial direction to the shaft core of the brush; and rotating the brush and polishing the inner circumference of the disk-shaped substrate.
摘要翻译: 用于抛光包括在其中心具有开口孔的部分的盘形基片的内圆周的盘形基底内圆周抛光方法包括:将具有轴芯的刷子插入具有盘形孔的开孔的部分中, 形基材; 将刷子的一端和另一端固定到一对旋转轴,所述一对旋转轴设置在相互分离的位置处,并且拉动刷子的一端和另一端中的至少任一个,并将轴向沿轴向施加张力 刷子的核心; 并旋转刷子并抛光盘状基板的内圆周。
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公开(公告)号:US20080176489A1
公开(公告)日:2008-07-24
申请号:US11898273
申请日:2007-09-11
申请人: Kazuyuki Haneda , Kunizo Watanabe , Yosuke Sato
发明人: Kazuyuki Haneda , Kunizo Watanabe , Yosuke Sato
CPC分类号: B24B5/06 , B24B9/08 , B24B29/005 , B24B29/04 , B24D13/10 , G11B5/8404
摘要: The disk-shaped substrate inner circumference polishing method for polishing an inner circumference of a disk-shaped substrate including a portion having an opening hole at the center thereof includes inserting a brush having a shaft core into the portion having the opening hole of the disk-shaped substrate; fixing one end and the other end of the brush to a pair of rotating shafts that are provided at mutually detached positions and pulling at least any one of the one end and the other end of the brush and applying tension in the axial direction to the shaft core of the brush; and rotating the brush and polishing the inner circumference of the disk-shaped substrate.
摘要翻译: 用于抛光包括在其中心具有开口孔的部分的盘形基片的内圆周的盘形基底内圆周抛光方法包括:将具有轴芯的刷子插入具有盘形孔的开孔的部分中, 形基材; 将刷子的一端和另一端固定到一对旋转轴,所述一对旋转轴设置在相互分离的位置处,并且拉动刷子的一端和另一端中的至少任一个,并将轴向沿轴向施加张力 刷子的核心; 并旋转刷子并抛光盘状基板的内圆周。
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