摘要:
A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising:(A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s),(B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.
摘要:
According to the present invention, there is provided a covering composition for optical fiber comprising (A) an unsaturated polyester oligomer having substantially two or more (meth)acryloyl group in a molecule wherein a glass transition temperature of a cured substance thereof is 100 to 350° C.; (B) at least one oligomer selected from the group consisting of the following components: (B-a) epoxy modified (meth)acrylate oligomer, (B-b) polyether polyol modified (meth)acrylate oligomer, and (B-c) urethane polyether polyol modified (meth)acrylate or urethane polyester polyol modified (meth)acrylate; and (C) a photopolymerization initiator, as essential components. The cured material has highly elasticity and is superior in the heat stability, and as a result, the present invention provides the superior covered optical fiber with well balanced heat stability of the optical transmission properties and flexibility.