公开(公告)号：US06333277B1

公开(公告)日：2001-12-25

申请号：US09725069

申请日：2000-11-29

申请人： Keng-Chu Lin ,  Hsiao-Wen Lee ,  Hou-Hung Chou ,  Yi-Wen Chen

发明人： Keng-Chu Lin ,  Hsiao-Wen Lee ,  Hou-Hung Chou ,  Yi-Wen Chen

IPC分类号： H01L2131

CPC分类号： H01L21/02129 ,  H01L21/02271 ,  H01L21/31625

摘要： A method for reducing non-homogenous density during forming process of borophosphosilicate glass layer, at least includes following basic steps: delivers an oxygen gas through a gas pipeline into a chamber, and also delivers a tetraethyl-orthosilicate gas, a tri-ethyl-borate gas and a tri-ethyl-phosphate gas through a reactant pipeline into a bypass pipeline to let the chamber is filled by only the oxygen gas, wherein the bypass pipeline is adjacent to the chamber; whenever flow of the oxygen gas in both the gas pipeline and the chamber is stable and flow of both the tetraethyl-orthosilicate gas, the tri-ethyl-borate gas and the tri-ethyl-phosphate gas in the reactant pipeline also is stable, closes the reactant pipeline and then delivers the tetraethyl-orthosilicate gas, the tri-ethyl-borate gas and the tri-ethyl-phosphate gas into the chamber; and performs at least a process to form a borophosphosilicate glass layer on a wafer that locates inside the chamber. Obviously, one essential characteristic of the method is reactants are delivered into chamber after flow of reactants are stable, and then non-homogenous density of borophosphosilicate glass layer that induced by unstable flow is effectively prevented.

摘要翻译： 一种在硼磷硅酸盐玻璃层形成过程中降低非均匀密度的方法至少包括以下基本步骤：将氧气通过气体管道输送到室中，并且还输送四乙基原硅酸盐气体，三乙基硼酸盐 气体和三乙基磷酸盐气体通过反应物管线进入旁路管道，以使腔室仅被氧气填充，其中旁路管道与腔室相邻; 只要气体管道和腔室中的氧气流都稳定，反应物管道中的四乙基原硅酸盐，三乙基硼酸盐气体和三乙基磷酸盐气体的流动也是稳定的，关闭 反应物管道，然后将四乙基原硅酸气体，三乙基硼酸盐气体和三乙基磷酸盐气体输送到室中; 并且至少执行在位于室内的晶片上形成硼磷硅酸盐玻璃层的工艺。 显然，该方法的一个基本特征是在反应物流动稳定后将反应物输送到室中，然后有效地防止了由不稳定流动引起的不均匀的硼磷硅酸盐玻璃层密度。