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公开(公告)号:US20200086277A1
公开(公告)日:2020-03-19
申请号:US15750742
申请日:2016-08-05
Inventor: Peng WANG , Bo TANG , Li-anbin ZHANG
IPC: B01D67/00 , B01D69/10 , B01D69/02 , B01D71/02 , C01B32/198 , C01B32/194
Abstract: Methods are provided for growing a thin film of a nanoscale material. Thin films of nanoscale materials are also provided. The films can be grown with microscale patterning. The method can include vacuum filtration of a solution containing the nanostructured material through a porous substrate. The porous substrate can have a pore size that is comparable to the size of the nanoscale material. By patterning the pores on the surface of the substrate, a film can be grown having the pattern on a surface of the thin film, including on the top surface opposite the substrate. The nanoscale material can be graphene, graphene oxide, reduced graphene oxide, molybdenum disulfide, hexagonal membrane boron nitride, tungsten diselenide, molybdenum trioxide, or clays such as montmorillonite or lapnotie. The porous strate can be a porous organic or inorganic membrane, a silicon stencil membrane, or similar membrane having pore sizes on the order of microns.