摘要:
A combustion state detecting apparatus for an internal combustion engine is imparted with facility for determining discriminatively the causes for non-occurrence of combustion. The apparatus includes a spark plug (4) for generating a spark discharge upon application of a high voltage generated by an ignition coil (1) in response to an ignition signal (X1) to thereby fire an air-fuel mixture within a cylinder of the internal combustion engine, an ion current detecting means (6A) for detecting as ion current detection signals (X2a; X2) an ion current corresponding to an amount of ions produced within the cylinder immediately after combustion of the air-fuel mixture, a signal detecting means (7A; 7B; 9) for comparing the ion current detection signal (X2a) outputted from the ion current detecting means (6A) with a first reference voltage (Vth1) to thereby output a first decision signal (X3) while comparing the ion current detection signal (X2) with a second reference voltage (Vth2) to thereby output a second decision signal (X4) while invalidating output of the second decision signal (X4) during a predetermine time period from a time point at which the comparison of the ion current detection signal (X2) with the second reference voltage (Vth2) is started, and an estimating logic unit (9, 10; 112) for estimating a cause for nongeneration of a combustion signal on the basis of output statuses of the first decision signal (X3) and the second decision signal (X4).
摘要:
To provide a combustion condition detecting apparatus for an internal combustion engine, which may well detect the combustion conditions such as discrimination of a combustion cylinder and knock generating condition and may reduce a circuit scale therefor, there are provided an ignition coil 21 provided for each cylinder; an ignition plug 20 for discharging by the application of the ignition high tension voltage to ignite mixture within the cylinder; a bias circuit 1 provided for each cylinder for applying a bias voltage to the ignition plug 20; an ionic current detection circuit 2 provided for each cylinder for detecting as an ionic current detection signal an ionic current 6 generated in the cylinder that is immediately after the combustion of the mixture; a knock signal processing circuit 4 provided one for a combination of a plurality of cylinders that are every two or more cylinders in ignition order on the basis of a sum of the ionic current detection signals; and an ECU 5 for detecting the combustion condition of the ignition plug on the basis of the knock signal.
摘要:
A method for manufacturing a solid state imaging device includes steps of forming a photodiode layer buried in a semiconductor substrate by ion injection and of forming a shielding layer buried in the photodiode layer by ion injection. At least in the ion injection process in the step of forming the shielding layer, an ion injection pause period is provided at least one time during whole ion injection step. According to the method, crystal defects are prevented from generating even if ion injection is performed with high energy, thereby suppressing dark current without complexity in manufacturing process.
摘要:
In a Karman vortex flow meter, a first space section is provided between a detection section and an inflow opening, and a second space section is provided between the detection section and an outflow opening. The first space and the second space have cross-sectional areas larger than a cross-sectional area of the detection passage. Accordingly, a disorder of a fluid coming in the inflow opening of the detection passage and pulsation components coming from the outflow opening are reduced by the first and second spaces.
摘要:
A method for manufacturing a semiconductor device includes steps of forming an embedded channel 12 in a semiconductor substrate 11, forming a resist layer on the embedded channel 12 through an oxide film 14, exposing the resist layer using a grating mask the light transmissivity of which varies toward transfer directions of electric charges, developing the exposed resist layer to form a resist mask having a gradient, forming a first impurity region 13 having a concentration gradient by injecting ions into the embedded channel 12 through the resist mask, and arranging transfer electrodes 15 at prescribed positions on the first impurity region 13 through the oxide film 14 after removing the resist mask, wherein a potential profile becomes deeper toward the transfer directions of the electric charges.
摘要:
A method for manufacturing a solid state imaging device includes steps of forming a photodiode layer buried in a semiconductor substrate by ion injection and of forming a shielding layer buried in the photodiode layer by ion injection. At least in the ion injection process in the step of forming the shielding layer, an ion injection pause period is provided at least one time during whole ion injection step. According to the method, crystal defects are prevented from generating even if ion injection is performed with high energy, thereby suppressing dark current without complexity in manufacturing process.
摘要:
A solid-state imaging device producing method includes the steps of: applying a resist material onto a substrate in which a channel region is formed; forming a resist layer by exposure and development of the resist material using a mask, the resist layer having an opening and a thin-film portion, the mask having a first region through which light is transmitted and a second region through which a smaller quantity of light than that the light transmitted through the first region is transmitted; subjecting the substrate to ion implantation using the resist layer as a mask to form an impurity region; etching the substrate using the resist layer as a mask after the ion implantation to form an alignment mark; and forming an electrode on the impurity region and part of the channel region using the alignment mark as a reference.
摘要:
Certain embodiments provide a method for producing a solid-state imaging device including the steps of forming an interconnection layer, forming a passivation film, forming a resist layer, forming a plurality of protruding portions and an opening, and forming an electrode pad. In the step of forming the interconnection layer, the interconnection layer is formed on the surface of the semiconductor substrate having a photodiode. In the step of forming the resist layer, the resist layer is formed on the passivation film such that the resist layer has a plurality of first openings above the photodiode and has a second opening above the interconnection of the interconnection layer. In the step of forming the plurality of protruding portions and the opening, the plurality of protruding portions and the opening are formed by etching the passivation film via the resist layer.
摘要:
A method for manufacturing a semiconductor device includes steps of forming an embedded channel 12 in a semiconductor substrate 11, forming a resist layer on the embedded channel 12 through an oxide film 14, exposing the resist layer using a grating mask the light transmissivity of which varies toward transfer directions of electric charges, developing the exposed resist layer to form a resist mask having a gradient, forming a first impurity region 13 having a concentration gradient by injecting ions into the embedded channel 12 through the resist mask, and arranging transfer electrodes 15 at prescribed positions on the first impurity region 13 through the oxide film 14 after removing the resist mask, wherein a potential profile becomes deeper toward the transfer directions of the electric charges.
摘要:
In a Karman vortex flow meter, a first space section is provided between a detection section and an inflow opening, and a second space section is provided between the detection section and an outflow opening. The first space and the second space have cross-sectional areas larger than a cross-sectional area of the detection passage. Accordingly, a disorder of a fluid coming in the inflow opening of the detection passage and pulsation components coming from the outflow opening are reduced by the first and second spaces.