PLATEMAKING APPARATUS AND PLATEMAKING METHOD

    公开(公告)号:US20220009220A1

    公开(公告)日:2022-01-13

    申请号:US17353746

    申请日:2021-06-21

    Abstract: The platemaking apparatus according to the present invention forms a pattern on an ink film-forming press plate that has a surface layer containing a stimulus-responsive compound whose physical property can reversibly change in response to an external stimulus. The platemaking apparatus includes: a first stimulator that applies, to a surface of the press plate, a first stimulus that changes the physical property of the surface from a first physical property to a second physical property to form the pattern, on the basis of image data; a second stimulator that applies, to the surface of the press plate, a second stimulus that changes the physical property of the surface from the second physical property to the first physical property, to erase the pattern; and a cleaning unit that removes an ink remained on the surface of the press plate.

    ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND ELECTROPHOTOGRAPHIC IMAGE FORMING METHOD AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS USING THE SAME

    公开(公告)号:US20200081360A1

    公开(公告)日:2020-03-12

    申请号:US16518251

    申请日:2019-07-22

    Abstract: An electrophotographic photoreceptor includes an outermost layer formed of a polymerized cured product of a composition containing a polymerizable monomer and metal oxide particles surface-treated with a surface treatment agent having a silicone chain, wherein a ratio (r/r′) between a number average primary particle diameter (r) of metal oxide particles which are untreated base particles of the metal oxide particles surface-treated with the surface treatment agent having a silicone chain and a sphere equivalent particle diameter (r′) of the untreated base particles calculated from a specific surface area measured by a nitrogen adsorption method is 1.5 or more and 6.0 or less, and a surface treatment amount with the surface treatment agent having a silicone chain per surface area of the untreated base particles is 0.0005 g/m2 or more and 0.0015 g/m2 or less.

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