Semiconductor optical devices with differential grating structure and method for manufacturing the same
    1.
    发明授权
    Semiconductor optical devices with differential grating structure and method for manufacturing the same 有权
    具有差分光栅结构的半导体光学器件及其制造方法

    公开(公告)号:US06885804B2

    公开(公告)日:2005-04-26

    申请号:US10280691

    申请日:2002-10-25

    摘要: A semiconductor optical device with a differential grating formed by a holography method and a method for manufacturing the same are provided. The provided semiconductor optical device includes an n-type InP substrate, a stack structure on the InP substrate having a waveguide and active layers, a first grating formed under the stack structure and on the InP substrate, and a second grating formed on the stack structure. The provided method for manufacturing the semiconductor optical device forms a first grating on the n-type InP substrate and under the active layer, and forms a second grating on the active layer. The first and second gratings are formed by the holography method.

    摘要翻译: 提供了一种通过全息方法形成的差分光栅的半导体光学器件及其制造方法。 所提供的半导体光学器件包括n型InP衬底,在具有波导和有源层的InP衬底上的堆叠结构,在堆叠结构下形成的第一栅极和InP衬底,以及形成在堆叠结构上的第二栅极 。 所提供的半导体光学器件的制造方法在n型InP衬底和有源层下形成第一光栅,并在有源层上形成第二光栅。 第一和第二光栅通过全息方法形成。