公开(公告)号：US20230041232A1

公开(公告)日：2023-02-09

申请号：US17775860

申请日：2021-08-12

Applicant: LG CHEM, LTD.

Inventor： Moon Sub HWANG ,  Jeong Seok LEE ,  Hong Min LEE ,  Jong Hun SONG ,  Kyung Seog YOUK ,  Min Ho SUN ,  Hyun Seok KIM

IPC: B01J8/02 ,  B01J8/00 ,  B01D19/00 ,  B01D5/00

Abstract: The present disclosure relates to an apparatus for preparing an oligomer, including: a reactor receiving a monomer stream and performing an oligomerization reaction to prepare a reaction product; a product discharge line for transferring a reaction product stream discharged from the reactor; and a bubble catcher provided in any area of the product discharge line to remove bubbles contained in the reaction product stream.

公开(公告)号：US20220340500A1

公开(公告)日：2022-10-27

申请号：US17633874

申请日：2021-07-01

Applicant: LG CHEM, LTD.

Inventor： Jong Hun SONG ,  Jeong Seok LEE ,  Hong Min LEE ,  Moon Sub HWANG ,  Min Ho SUN ,  Kyung Seog YOUK

IPC: C07C2/04

Abstract: An apparatus for preparing an oligomer including: a reactor supplied with a monomer stream and a solvent stream to perform an oligomerization reaction; a product discharge line provided on a lower portion of a side surface of the reactor; a washing liquid supply line connected to a first point of the product discharge line; and a washing liquid discharge line extending from a second point of the product discharge line, wherein the product discharge line includes a branch point at which the product discharge line is branched into two or more lines and a junction point at which the respective branched lines are joined, and the product discharge line includes pressure control devices provided in each of the two or more branched lines.

公开(公告)号：US20220379277A1

公开(公告)日：2022-12-01

申请号：US17772086

申请日：2021-07-22

Applicant: LG CHEM, LTD.

Inventor： Hong Min LEE ,  Moon Sub HWANG ,  Min Ho SUN ,  Jong Hun SONG ,  Kyung Seog YOUK ,  Jeong Seok LEE

IPC: B01J4/00 ,  B01J19/06 ,  B01J19/24

Abstract: Provided are a sparger including: a disc-shaped body; and a first hole and a second hole having different sizes from each other provided in the body, wherein a diameter of the second hole is smaller than a diameter of the first hole, and a reactor comprising the sparger.

公开(公告)号：US20230183148A1

公开(公告)日：2023-06-15

申请号：US17777962

申请日：2021-09-06

Applicant: LG CHEM, LTD.

Inventor： Kyung Seog YOUK ,  Min Ho SUN ,  Jong Hun SONG ,  Hong Min LEE ,  Moon Sub HWANG ,  Jeong Seok LEE

IPC: C07C2/06 ,  C07C7/00 ,  C07C7/148 ,  C07C7/08

CPC classification number: C07C2/06 ,  C07C7/005 ,  C07C7/14883 ,  C07C7/08

Abstract: Provided is a method of producing an oligomer, the method including: supplying a monomer stream and a solvent stream to a reactor to perform an oligomerization reaction to produce a reaction product; supplying a discharge stream of the reactor to a separation device, and supplying an upper discharge stream of the separation device including an unreacted monomer to the reactor and supplying a lower discharge stream of the separation device to a settling tank; settling a polymer in the settling tank and removing the polymer, and supplying the lower discharge stream of the separation device from which the polymer is removed to a high-boiling point separation column; removing a high-boiling point material from a lower discharge stream of the high-boiling point separation column and supplying an upper discharge stream of the high-boiling point separation column including an oligomer to a solvent separation column; and separating a solvent and the oligomer in the solvent separation column.

公开(公告)号：US20220347648A1

公开(公告)日：2022-11-03

申请号：US17629359

申请日：2021-07-09

Applicant: LG CHEM, LTD.

Inventor： Moon Sub HWANG ,  Min Ho SUN ,  Jong Hun SONG ,  Kyung Seog YOUK ,  Jeong Seok LEE ,  Hong Min LEE

IPC: B01J19/26 ,  B01J10/00 ,  B01J4/00 ,  C07C2/08

Abstract: The present disclosure relates to an apparatus for preparing an oligomer, and more particularly, to an apparatus for preparing an oligomer including: a reactor including a gaseous area having a first gaseous reactant inlet provided at a lower portion thereof, and a reaction area in which a reaction medium reacts with the gaseous reactant above the gaseous area; a second gaseous reactant inlet provided on an inner wall of the reactor in the gaseous area and a third gaseous reactant inlet provided on an inner wall of the reactor facing the second gaseous reactant inlet; and a first injection nozzle connected to the second gaseous reactant inlet and a second injection nozzle connected to the third gaseous reactant inlet.