Optical integrators for lithography systems and methods
    1.
    发明授权
    Optical integrators for lithography systems and methods 有权
    用于光刻系统和方法的光学积分器

    公开(公告)号:US07630136B2

    公开(公告)日:2009-12-08

    申请号:US11488174

    申请日:2006-07-18

    IPC分类号: G02B27/14

    CPC分类号: G03F7/70075

    摘要: An optical integrator having a first surface and a second surface that is used in a lithographic apparatus to modify light. The first surface is reflective, defines a volume, and is configured to be disposed in an optical illumination system along an optical axis, to surround the optical axis, and to reflect a light along a path incident upon the first surface. The second surface is disposed in the volume and has a first section of the second surface that is semi-reflective and is configured to reflect a first portion of a light along a path incident upon the first section of the second surface and to transmit a second portion of the light along the path incident upon the first section of the second surface. The second surface increases the number of reflections of the light to increase the uniformity of the intensity distribution of the light.

    摘要翻译: 具有第一表面和第二表面的光学积分器,其用于光刻设备中以修改光。 第一表面是反射的,限定了一个体积,并被配置为沿光轴布置在光学照明系统中,以围绕光轴,并且沿着入射在第一表面上的路径反射光。 第二表面设置在体积中并且具有半反射的第二表面的第一部分,并且被配置为沿着入射在第二表面的第一部分上的路径反射光的第一部分,并且透射第二表面 沿着入射到第二表面的第一部分的路径的光的一部分。 第二表面增加了光的反射数以增加光的强度分布的均匀性。