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公开(公告)号：US20250092507A1
公开(公告)日：2025-03-20
申请号：US18884592
申请日：2024-09-13
Applicant: Li-Metal Corp.
Inventor： Maciej Jastrzebski , Kristyn M. Zoschke
Abstract: A physical vapour deposition apparatus includes: a rotating drum carrying a substrate; a molten metal bath spaced from the substrate; a metal vapour conduit extending between the molten metal bath and the substrate, the metal vapour conduit having at least one wall; and temperature control elements configured to control a temperature of the at least one wall.
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