公开(公告)号：US20240230984A9

公开(公告)日：2024-07-11

申请号：US18191683

申请日：2023-03-28

申请人： Lumentum Operations LLC

发明人： Peter HOFMANN ,  Peter JAKOPIC ,  Martin H. MUENDEL

IPC分类号： G02B6/02 ,  C03B37/012 ,  C03B37/018 ,  C03B37/027

CPC分类号： G02B6/02338 ,  C03B37/01217 ,  C03B37/01815 ,  C03B37/02718 ,  C03B37/02736 ,  G02B6/02395

摘要： In some implementations, a substrate tube in a modified chemical vapor deposition process may rotate while glass precursors flow into the substrate tube at a fixed rate. Dopants may be delivered into the substrate tube while heat is applied to the substrate tube to deposit, on an inner wall of the substrate tube, a layer of material including the glass precursors and the dopants. A lateral position of an exit of an injection tube used to deliver the dopants may be adjusted while the substrate tube is rotated and heat is applied to the substrate tube such that the material deposited on the inner wall of the substrate tube has an azimuthally non-uniform doping concentration. Alternatively, a rotation of the substrate tube may be adjusted to create opposing temperature gradients within the substrate tube, causing non-uniform layer deposition to occur on different sides of the substrate tube in alternating passes.

公开(公告)号：US20240134113A1

公开(公告)日：2024-04-25

申请号：US18191683

申请日：2023-03-27

申请人： Lumentum Operations LLC

发明人： Peter HOFMANN ,  Peter JAKOPIC ,  Martin H. MUENDEL

IPC分类号： G02B6/02 ,  C03B37/012 ,  C03B37/018 ,  C03B37/027

CPC分类号： G02B6/02338 ,  C03B37/01217 ,  C03B37/01815 ,  C03B37/02718 ,  C03B37/02736 ,  G02B6/02395

摘要： In some implementations, a substrate tube in a modified chemical vapor deposition process may rotate while glass precursors flow into the substrate tube at a fixed rate. Dopants may be delivered into the substrate tube while heat is applied to the substrate tube to deposit, on an inner wall of the substrate tube, a layer of material including the glass precursors and the dopants. A lateral position of an exit of an injection tube used to deliver the dopants may be adjusted while the substrate tube is rotated and heat is applied to the substrate tube such that the material deposited on the inner wall of the substrate tube has an azimuthally non-uniform doping concentration. Alternatively, a rotation of the substrate tube may be adjusted to create opposing temperature gradients within the substrate tube, causing non-uniform layer deposition to occur on different sides of the substrate tube in alternating passes.