Alignment-overlay mark and method using the same

    公开(公告)号:US12265335B2

    公开(公告)日:2025-04-01

    申请号:US17933968

    申请日:2022-09-21

    Abstract: According to one or more embodiments of the disclosure, an alignment-overlay mark is provided. The alignment-overlay mark includes a pair of first marks and a plurality of second marks. The first marks extend in a first direction and are arranged in parallel to each other in a second direction. The second direction is perpendicular to the first direction. The second marks are between the first marks, extend in the second direction and are arranged in parallel to each other in the first direction.

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