BASE STATION OF CLEANING DEVICE AND CLEANING SYSTEM

    公开(公告)号:US20240225404A9

    公开(公告)日:2024-07-11

    申请号:US18546973

    申请日:2021-05-11

    Abstract: A base station of a cleaning device and a cleaning system are provided. The base station of the cleaning device includes: a base station body having an accommodating chamber for accommodating the cleaning device and an opening for the cleaning device to enter or exit the accommodating chamber; and a water injection assembly including a movable base, and a movable plate, a lifting mechanism, and a water injection pipe that are disposed on the movable base. The water injection pipe is configured to inject water into the cleaning device. The lifting mechanism is configured to drive the water injection pipe to move. A first elastic member is disposed between the movable plate and a side wall of the accommodating chamber. The cleaning device is contacted with the movable plate during a water injection process of the water injection assembly.

    BASE STATION OF CLEANING DEVICE AND CLEANING SYSTEM

    公开(公告)号:US20240130597A1

    公开(公告)日:2024-04-25

    申请号:US18546973

    申请日:2021-05-10

    Abstract: A base station of a cleaning device and a cleaning system are provided. The base station of the cleaning device includes: a base station body having an accommodating chamber for accommodating the cleaning device and an opening for the cleaning device to enter or exit the accommodating chamber; and a water injection assembly including a movable base, and a movable plate, a lifting mechanism, and a water injection pipe that are disposed on the movable base. The water injection pipe is configured to inject water into the cleaning device. The lifting mechanism is configured to drive the water injection pipe to move. A first elastic member is disposed between the movable plate and a side wall of the accommodating chamber. The cleaning device is contacted with the movable plate during a water injection process of the water injection assembly.

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