Cycloalkanebis(methylamine)isomerization
    1.
    发明授权
    Cycloalkanebis(methylamine)isomerization 失效
    CYCLOALKANEBIS(METHYLAMINE)异构化

    公开(公告)号:US3829490A

    公开(公告)日:1974-08-13

    申请号:US17224671

    申请日:1971-08-16

    申请人: MONSANTO CO

    发明人: MUELLER W CAMPBELL C

    CPC分类号: C07C211/18

    摘要: THE ISOMER RATIO IN A NON-EQUILIBRATED MIXTURE OF THE CIS AND TRANS ISOMERS OF A C6-C14 CYCLOALKYLANEBIS(METHYLAMINE9 SUCH AS 1,4-CYCLOHEXNEBIS(METHYLAMINE) CAN BE CONVENIENTLY ALTERED BY CONTACTING THE MIXTURE AT 175*290*C. WITH HYDROGEN IN THE PRESENCE OF A HYDROGENATION CATALYST AND AMMONIA. A HIGH YEILD OF ONE OF SUCH ISOMERS CAN BE OBTAINED BY SIMILARLY CONTACTING A MIXTURE OF SUCH ISOMERS WHEREIN THE RATIO OF SAID ONE ISOMER TO THE OTHER OF SAID ISOMERS IS LOWER THAN THE CORRESPONDING EQUILBRIUM RATIO OF SUCH ISOMERS, SELECTIVELY SEPARATING SAID ONE ISOMER FROM THE CONTACTED MIXTURE AND RECYCLING THE RESIDUAL MIXTURE FOR MORE OF SUCH CONTACTING.

    Process for hydrodimerizing olefinic compounds
    2.
    发明授权
    Process for hydrodimerizing olefinic compounds 失效
    高效液相化合物的方法

    公开(公告)号:US3830712A

    公开(公告)日:1974-08-20

    申请号:US28437372

    申请日:1972-08-28

    申请人: MONSANTO CO

    CPC分类号: C25B3/105

    摘要: IN A PROCESS FOR HYDRODIMERIZING AN OLEFINIC NITRILE, AMIDE OR ESTER BY ELECTROLYZING AN AQUEOUS SOLUTION OF THE OLEFINIC COMPOUND, AN ALKALI METAL SALT AND QUATERNARY AMMONIUM CATIONS, THE SELECTIVELY WITH WHICH THE HYDRODIMER IS PRODUCED IS SURPRISINGLY HIGH WHEN THE SOLUTION CONTAINS LESS THAN ABOUT 5% BY WEIGHT OF THE OLEFINIC COMPOUND, MORE THAN 5% BY WEIGHT OF THE ALKALI METAL SALT AND/OR ALKALI METAL CATIONS CONSTITUTING MORE THAN HALF OF THE TOTAL WEIGHT OF ALL CATIONS IN THE SOLUTION AND THE SOLUTION IS ELECTROLYZED IN CONTACT WITH A CATHODE CONSISTING ESSENTIALLY OF CADMIUM. EVEN IN A CELL IN WHICH THE ANODE IS IN CONTACT WITH THE SLUTION, FOULING OF SUCH A CATHODE PROCEEDS VERY SLOWLY AND THE HYDRODIMER SELECTIVITY REMAINS HIGH FOR AN EXCEPTIONALLY LONG TIME WHEN THE CATHODIC SURFACE HAS A CENTERLINE AVERAGE NOT GREATER THAN ABOUT 90 MICROINCHES.