Photoreactive agent containing photoreactive semiconductor for removing harmful materials
    2.
    发明授权
    Photoreactive agent containing photoreactive semiconductor for removing harmful materials 失效
    含光反应性半导体去除有害物质的光反应剂

    公开(公告)号:US06346253B2

    公开(公告)日:2002-02-12

    申请号:US08807701

    申请日:1997-02-28

    IPC分类号: A01N2500

    摘要: A photoreactive agent is provided for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor, a layer containing film-forming inorganic fine particles and a layer containing a water repellent which layers are formed in that order on at least one side of the substrate. The photoreactive agents for removing harmful materials are excellent in ability to remove harmful materials such as malodor, are water-resistant, are not changed in characteristics over a long period of time, and can easily be produced.

    摘要翻译: 提供了一种光反应剂,用于去除有害材料,该有害材料包括基材和含有光反应性半导体的层和涂覆有无机细颗粒的有机细颗粒,其形成在基材的至少一侧上。 提供了一种光反应剂,用于除去有害材料,其包括基材,含有光反应性半导体的层和包含无机细颗粒的有机细颗粒层,该层在基材的至少一侧依次形成。 提供了一种光反应剂,用于除去基材,含有光反应性半导体的层和含有成膜无机细颗粒的层以及防水剂,该有害物质在基材的至少一侧依次形成。 提供了一种光反应剂,用于除去有害材料,该有害物质包括基材,含有光反应性半导体的层,含有成膜无机细颗粒的层和含有防水剂的层,该层在至少一个 底物。 用于除去有害物质的光反应性试剂在除去有害物质如恶臭的能力方面具有优异的性能,耐水性,长时间不变化的特性,并且可以容易地生产。