COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR CREATING A METROLOGY TARGET STRUCTURE DESIGN FOR A RETICLE LAYOUT
    1.
    发明申请
    COMPUTER-IMPLEMENTED METHODS, CARRIER MEDIA, AND SYSTEMS FOR CREATING A METROLOGY TARGET STRUCTURE DESIGN FOR A RETICLE LAYOUT 有权
    计算机实现的方法,载体介质和系统,用于创建用于反映布局的度量目标结构设计

    公开(公告)号:US20070276634A1

    公开(公告)日:2007-11-29

    申请号:US11685501

    申请日:2007-03-13

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5009 G03F1/44

    摘要: Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.

    摘要翻译: 提供了计算机实现的方法,载体介质和用于创建标线布局的计量目标结构设计的系统。 用于创建标线布局的计量目标结构设计的一种计算机实现的方法包括模拟如何在晶片上形成一个或多个初始计量目标结构,所述一个或多个初始计量目标结构将基于将用于形成计量目标结构的一个或多个制造过程 晶圆和一个或多个初始计量目标结构设计。 该方法还包括基于模拟步骤的结果创建计量目标结构设计。

    Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
    2.
    发明授权
    Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout 有权
    计算机实现的方法,载体介质和用于创建光罩布局的计量目标结构设计的系统

    公开(公告)号:US07925486B2

    公开(公告)日:2011-04-12

    申请号:US11685501

    申请日:2007-03-13

    IPC分类号: G06F17/50 G02B23/10

    CPC分类号: G06F17/5009 G03F1/44

    摘要: Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.

    摘要翻译: 提供了计算机实现的方法,载体介质和用于创建标线布局的计量目标结构设计的系统。 用于创建标线布局的计量目标结构设计的一种计算机实现的方法包括模拟如何在晶片上形成一个或多个初始计量目标结构,所述一个或多个初始计量目标结构将基于将用于形成计量目标结构的一个或多个制造过程 晶圆和一个或多个初始计量目标结构设计。 该方法还包括基于模拟步骤的结果创建计量目标结构设计。