公开(公告)号：US08773639B2

公开(公告)日：2014-07-08

申请号：US12632055

申请日：2009-12-07

申请人： Markus Deguenther ,  Andras G. Major ,  Anne Christine Andresen

发明人： Markus Deguenther ,  Andras G. Major ,  Anne Christine Andresen

IPC分类号： G03B27/72

CPC分类号： G03F7/70425 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/702

摘要： An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.

摘要翻译： 微光刻投影曝光装置的照明系统包括光瞳表面和单独驱动的光束偏离元件的布置。 响应于施加到光束偏离元件的控制信号，每个光束偏离元件被配置为将光照射到其上的光瞳表面上的不同位置上。 根据本公开，提供了一种衰减单元，其被配置为减少由任何任意的光束偏离元件（在瞳孔表面上）超过50％的光的强度，这使得可以降低光的强度 在瞳孔表面已经被有缺陷的光束偏离元件反射。

公开(公告)号：US20100103400A1

公开(公告)日：2010-04-29

申请号：US12632055

申请日：2009-12-07

申请人： Markus Deguenther ,  Andras G. Major ,  Anne Christine Andresen

发明人： Markus Deguenther ,  Andras G. Major ,  Anne Christine Andresen

IPC分类号： G03B27/72

CPC分类号： G03F7/70425 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/702

摘要： An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.

摘要翻译： 微光刻投影曝光装置的照明系统包括光瞳表面和单独驱动的光束偏离元件的布置。 响应于施加到光束偏离元件的控制信号，每个光束偏离元件被配置为将光照射到其上的光瞳表面上的不同位置上。 根据本公开，提供了一种衰减单元，其被配置为减少由任何任意的光束偏离元件（在瞳孔表面上）超过50％的光的强度，这使得可以降低光的强度 在瞳孔表面已经被有缺陷的光束偏离元件反射。