公开(公告)号：US20070054497A1

公开(公告)日：2007-03-08

申请号：US10555562

申请日：2004-05-06

申请人： Markus Weiss ,  Marco Wedowski ,  Bas Mertens ,  Bas Wolschrijn ,  Bart Van Mierlo ,  Norbert Koster ,  Jan Van Elp ,  Anton Duiserwinkel ,  Annemieke Van De Runstraat

发明人： Markus Weiss ,  Marco Wedowski ,  Bas Mertens ,  Bas Wolschrijn ,  Bart Van Mierlo ,  Norbert Koster ,  Jan Van Elp ,  Anton Duiserwinkel ,  Annemieke Van De Runstraat

IPC分类号： H01L21/00 ,  G03G15/00 ,  H01L21/31

CPC分类号： G03F7/70983 ,  G03F7/70916 ,  G21K1/06

摘要： The invention relates to a method for preventing contamination of the surfaces of reflective optical elements for the soft X-ray and EUV wavelength range during their irradiation at operating wavelength in an evacuated closed system having a residual gas atmosphere, said elements comprising a cover layer consisting of at least one transition metal. According to said method a residual gas atmosphere is adjusted. The aim of the invention is to prevent a degradation of the surfaces by deposition of carbon and by surface oxidation. For this purpose, both a reducing gas or gas mixture and a gas or gas mixture containing oxygen atoms are introduced. In conjunction with the cover layer of the reflective optical element that consists of a transition metal a degradation of the surface is effectively prevented

摘要翻译： 本发明涉及一种防止在具有残留气体气氛的抽空封闭系统中在其工作波长下照射时用于软X射线和EUV波长范围的反射光学元件表面的污染的方法，所述元件包括覆盖层， 的至少一种过渡金属。 根据所述方法，调节残留气体气氛。 本发明的目的是通过沉积碳和表面氧化来防止表面的降解。 为此，引入还原气体或气体混合物以及含有氧原子的气体或气体混合物。 结合由过渡金属组成的反射光学元件的覆盖层，有效地防止了表面的劣化