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公开(公告)号：US06801232B2
公开(公告)日：2004-10-05
申请号：US10115677
申请日：2002-04-04
申请人： Masamitsu Nagamine , Norio Nakajima , Yu Kobayashi
发明人： Masamitsu Nagamine , Norio Nakajima , Yu Kobayashi
IPC分类号： B41J239
CPC分类号： B41J25/308 , G03G15/04054 , G03G15/326
摘要： A positioning apparatus for an optical head includes a cylindrical photoconductive drum, an optical head, and at least one spacer. The cylindrical photoconductive drum extends in a direction of a longitudinal axis thereof. The optical head extends parallel to the longitudinal axis. The spacer is disposed to abut the photoconductive drum, limiting a distance between the optical head and the photoconductive drum. The photoconductive drum has a photoconductor and the spacer is in contact with the photoconductor through sliding friction. The spacer has a first surface in contact with the photoconductor. The photoconductor has a second surface in contact with the first surface. The first surface has a first curvature and the second surface has a second curvature. When the first surface is pressed against the second surface, the spacer may deform resiliently so that the first curvature becomes substantially equal to the second curvature.
摘要翻译： 一种用于光学头的定位装置包括圆柱形感光鼓，光学头和至少一个间隔件。 圆柱形感光鼓在其纵向轴线的方向上延伸。 光学头平行于纵向轴线延伸。 间隔件设置成邻接感光鼓，限制光头和感光鼓之间的距离。 感光鼓具有光电导体，并且间隔物通过滑动摩擦与感光体接触。 间隔物具有与感光体接触的第一表面。 光电导体具有与第一表面接触的第二表面。 第一表面具有第一曲率并且第二表面具有第二曲率。 当第一表面被压在第二表面上时，间隔件可以弹性变形，使得第一曲率变得基本上等于第二曲率。
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2.发明授权Exposure device and image forming apparatus with supporting member for focusing lens and light emitting element array 有权具有用于聚焦透镜和发光元件阵列的支撑构件的曝光装置和图像形成装置公开(公告)号：US07760224B2
公开(公告)日：2010-07-20
申请号：US12230240
申请日：2008-08-26
申请人： Masamitsu Nagamine
发明人： Masamitsu Nagamine
IPC分类号： B41J2/45
CPC分类号： G03G15/04054 , G03G2215/0409
摘要： An exposure device includes a substrate on which a light emitting element array is provided, a focusing lens that focuses light emitted by the light emitting element array, a supporting member that supports the substrate and the focusing lens. The supporting member has a contact surface. A base is provided for forcing the substrate against the contact surface of the supporting member. The base has a first engaging portion that engages a second engaging portion formed on an inner wall of the supporting member. The base is mounted to the supporting member by the engagement of the first engaging portion and the second engaging portion.
摘要翻译： 曝光装置包括其上设置有发光元件阵列的基板，聚焦透镜，其聚焦由发光元件阵列发射的光，支撑构件，其支撑基板和聚焦透镜。 支撑构件具有接触表面。 提供用于将基板强制抵靠支撑构件的接触表面的基座。 底座具有接合形成在支撑构件的内壁上的第二接合部的第一接合部。 基座通过第一接合部和第二接合部的接合而安装在支撑部件上。
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公开(公告)号：US6009299A
公开(公告)日：1999-12-28
申请号：US224298
申请日：1998-12-31
CPC分类号： G03G9/093 , G03G13/20 , G03G9/09307 , G03G9/0935
摘要： A developing roller rotates in contact with a photoreceptor drum. The developing roller controls a development thorough the formation of a toner layer 50 .mu.m or less in thickness on an outer surface. The photoreceptor drum transfers a toner image formed on the outer surface by the controlled-development onto a medium. A fixation device heat-treats and fixes the toner image transferred onto the medium. A toner for the developing treatment comprises a resin having a Tg of 75.degree. C. or more as at least part of it.
摘要翻译： 显影辊与感光鼓接触旋转。 显影辊控制在外表面上形成厚度为50μm或更小的调色剂层的显影。 感光鼓通过受控显影将形成在外表面上的调色剂图像转印到介质上。 固定装置热处理并固定转印到介质上的调色剂图像。 用于显影处理的调色剂包括Tg至少为其一部分的Tg为75℃或更高的树脂。
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公开(公告)号：US08547411B2
公开(公告)日：2013-10-01
申请号：US13233391
申请日：2011-09-15
申请人： Masamitsu Nagamine , Yo Kishikawa
发明人： Masamitsu Nagamine , Yo Kishikawa
CPC分类号： B41J2/45
摘要： An exposure device includes: a substrate on which a plurality of light emitting elements are mounted; an optical system that converges light irradiated from the light emitting elements onto a photosensitive surface; a holding member that holds and fixes the substrate; a support member that supports the optical system and the holding member; a first adhesive member that is provided between the substrate and the holding member; and a second adhesive member that is provided between the holding member and the support member, wherein the first adhesive member has higher elongation and lower hardness than the second adhesive member.
摘要翻译： 曝光装置包括：其上安装有多个发光元件的基板; 将从发光元件照射的光会聚到感光面上的光学系统; 保持构件，其保持并固定所述基板; 支撑构件，其支撑光学系统和保持构件; 设置在所述基板和所述保持部件之间的第一粘合部件; 以及设置在所述保持构件和所述支撑构件之间的第二粘合构件，其中所述第一粘合构件具有比所述第二粘合构件更高的伸长率和更低的硬度。
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公开(公告)号：US20090080938A1
公开(公告)日：2009-03-26
申请号：US12230240
申请日：2008-08-26
申请人： Masamitsu Nagamine
发明人： Masamitsu Nagamine
IPC分类号： G03G15/04
CPC分类号： G03G15/04054 , G03G2215/0409
摘要： An exposure device includes a substrate on which a light emitting element array is provided, a focusing lens that focuses light emitted by the light emitting element array, a supporting member that supports the substrate and the focusing lens. The supporting member has a contact surface. A base is provided for forcing the substrate against the contact surface of the supporting member. The base has a first engaging portion that engages a second engaging portion formed on an inner wall of the supporting member. The base is mounted to the supporting member by the engagement of the first engaging portion and the second engaging portion.
摘要翻译： 曝光装置包括其上设置有发光元件阵列的基板，聚焦透镜，其聚焦由发光元件阵列发射的光，支撑构件，其支撑基板和聚焦透镜。 支撑构件具有接触表面。 提供用于将基板强制抵靠支撑构件的接触表面的基座。 底座具有接合形成在支撑构件的内壁上的第二接合部的第一接合部。 基座通过第一接合部和第二接合部的接合而安装在支撑部件上。
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公开(公告)号：US20100195079A1
公开(公告)日：2010-08-05
申请号：US12662324
申请日：2010-04-12
申请人： Masamitsu Nagamine
发明人： Masamitsu Nagamine
IPC分类号： G03B27/72
CPC分类号： G03G15/04054 , G03G2215/0409
摘要： An exposure device includes a substrate on which a light emitting element array is provided, a focusing lens that focuses light emitted by the light emitting element array, a supporting member that supports the substrate and the focusing lens. The supporting member has a contact surface. A base is provided for forcing the substrate against the contact surface of the supporting member. The base has a first engaging portion that engages a second engaging portion formed on an inner wall of the supporting member. The base is mounted to the supporting member by the engagement of the first engaging portion and the second engaging portion.
摘要翻译： 曝光装置包括其上设置有发光元件阵列的基板，聚焦透镜，其聚焦由发光元件阵列发射的光，支撑构件，其支撑基板和聚焦透镜。 支撑构件具有接触表面。 提供用于将基板强制抵靠支撑构件的接触表面的基座。 底座具有接合形成在支撑构件的内壁上的第二接合部的第一接合部。 基座通过第一接合部和第二接合部的接合而安装在支撑部件上。
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公开(公告)号：US06809752B2
公开(公告)日：2004-10-26
申请号：US10446072
申请日：2003-05-28
申请人： Masamitsu Nagamine
发明人： Masamitsu Nagamine
IPC分类号： B41J245
CPC分类号： B41J2/45
摘要： An LED head is supplied which is able not only to reduce cost but also to improve disintegration efficiency and assembly efficiency. The LED head comprises a SLA holder with electroconductivity which has a insulating cover and supports a rod lens array with convergency; a substrate which is mounted in the SLA holder and is used for installing a LED array chip; a base with electroconductivity used for fixing the substrate at the SLA holder; and a clamp with electroconductivity which presses and contacts the base, wherein the clamp, while mounted onto the SLA holder, scrapes off contact part of the insulating cover.
摘要翻译： 提供的LED头不仅可以降低成本，而且可以提高分解效率和组装效率。 LED头包括具有导电性的SLA保持器，其具有绝缘盖并且以可收敛的方式支撑棒状透镜阵列; 安装在SLA支架中并用于安装LED阵列芯片的基板; 用于将基板固定在SLA支架上的具有导电性的基座; 以及压接和接触基座的具有导电性的夹具，其中所述夹具在安装到SLA保持器上时刮掉绝缘盖的接触部分。
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8.发明授权Developing unit for an electrophotographic printer employing a supply roller for transferring toner to a developing roller 失效用于使用供给辊将电影转印到显影辊上的电子照相打印机的显影单元
公开(公告)号：US5839021A
公开(公告)日：1998-11-17
申请号：US897273
申请日：1997-07-21
CPC分类号： G03G15/0808 , G03G2215/0617
摘要： The developing unit of an electrostatic printer is designed to avoid under-development of the bottom part of a dark latent image due to a reduction in recycled toner. This can be accomplished by providing the developing unit with one developing roller and at least two supply rollers. Alternatively, the developing unit has just one supply roller, but the rate at which toner is transferred from the supply roller to the developing roller can be switched. As another alternative, the supply roller and developing roller are designed to turn slowly enough that development of an entire page is completely developed before reaching the point where under-development would begin.
摘要翻译： 静电打印机的显影单元被设计成避免由于再循环调色剂的减少导致的暗色潜像的底部的欠展开。 这可以通过为显影单元提供一个显影辊和至少两个供给辊来实现。 或者，显影单元仅具有一个供应辊，但是可以切换调色剂从供给辊传递到显影辊的速率。 作为另一个替代方案，供应辊和显影辊被设计成缓慢地转动，使得整个页面的开发在到达开发不足的点之前被完全开发。
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9.发明授权Exposing device having light emitting elements and image forming apparatus using the same 有权具有发光元件的曝光装置和使用其的图像形成装置公开(公告)号：US08390662B2
公开(公告)日：2013-03-05
申请号：US12907106
申请日：2010-10-19
申请人： Masamitsu Nagamine , Takao Sakai
发明人： Masamitsu Nagamine , Takao Sakai
CPC分类号： B41J2/45
摘要： An exposing device includes a plurality of light emitting elements, a substrate to which the plurality of light emitting elements are mounted, an optical system that focuses lights emitted by the plurality of light emitting elements, and a holder that holds the optical system. The holder has a substrate abutting surface that abuts against the substrate. The holder includes a base material portion made of metal, and a substrate abutting portion formed integrally with the base material portion. The substrate abutting portion is made of resin having electrical insulation property. The surface abutting surface is formed on the surface abutting portion.
摘要翻译： 曝光装置包括多个发光元件，安装有多个发光元件的基板，聚焦由多个发光元件发出的光的光学系统和保持光学系统的保持器。 保持器具有与基板抵接的基板抵接面。 保持器包括由金属制成的基材部分和与基材部分一体形成的基板抵接部。 基板抵接部由具有电绝缘性的树脂制成。 表面邻接表面形成在表面抵接部分上。
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公开(公告)号：US08305418B2
公开(公告)日：2012-11-06
申请号：US12662324
申请日：2010-04-12
申请人： Masamitsu Nagamine
发明人： Masamitsu Nagamine
IPC分类号： B41J2/45
CPC分类号： G03G15/04054 , G03G2215/0409
摘要： An exposure device includes a substrate on which a light emitting element array is provided, a focusing lens that focuses light emitted by the light emitting element array, a supporting member that supports the substrate and the focusing lens. The supporting member has a contact surface. A base is provided for forcing the substrate against the contact surface of the supporting member. The base has a first engaging portion that engages a second engaging portion formed on an inner wall of the supporting member. The base is mounted to the supporting member by the engagement of the first engaging portion and the second engaging portion.
摘要翻译： 曝光装置包括其上设置有发光元件阵列的基板，聚焦透镜，其聚焦由发光元件阵列发射的光，支撑构件，其支撑基板和聚焦透镜。 支撑构件具有接触表面。 提供用于将基板强制抵靠支撑构件的接触表面的基座。 底座具有接合形成在支撑构件的内壁上的第二接合部的第一接合部。 基座通过第一接合部和第二接合部的接合而安装在支撑部件上。
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